394505
Xenon difluoride
99.99% trace metals basis
Synonym(s):
Xenon Fluoride (XeF2)
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About This Item
Linear Formula:
XeF2
CAS Number:
Molecular Weight:
169.29
EC Number:
MDL number:
UNSPSC Code:
12352300
PubChem Substance ID:
NACRES:
NA.23
Recommended Products
vapor pressure
3.8 mmHg ( 25 °C)
Quality Level
Assay
99.99% trace metals basis
form
crystals
mp
129 °C (lit.)
density
4.32 g/mL at 25 °C (lit.)
SMILES string
F[Xe]F
InChI
1S/F2Xe/c1-3-2
InChI key
IGELFKKMDLGCJO-UHFFFAOYSA-N
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General description
Xenon fluoride may be obtained by interacting elemental xenon and fluorine in the temperature range of 473-523 oC and 5 absolute atmosphere. Xenon difluoride readily interacts with Lewis acid and forms complexes.
Application
Very useful fluorination agent. Xenon fluoride may be used as a fluorinating agent to analyze sulphur, selenium and tellurium by gas chromatography.
Packaging
Packaged in PFA/FEP bottles
Signal Word
Danger
Hazard Statements
Precautionary Statements
Hazard Classifications
Acute Tox. 1 Inhalation - Acute Tox. 3 Oral - Eye Dam. 1 - Ox. Sol. 2 - Skin Corr. 1B
Storage Class Code
5.1B - Oxidizing hazardous materials
WGK
WGK 3
Flash Point(F)
Not applicable
Flash Point(C)
Not applicable
Personal Protective Equipment
dust mask type N95 (US), Eyeshields, Gloves
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Infrared spectra of complex compounds of xenon difluoride with ruthenium pentafluoride
Prusakov VN, et al.
Journal of Applied Spectroscopy, 17(1), 920-922 (1972)
Use of Xenon difluoride for the determination of sulfur, selenium and tellurium as the volatile fluorides by gas chromatography
Aleinikov NN, et al.
Russian Chemical Bulletin, 22(11), 2552-2554 (1973)
James P Camp et al.
Biomedical microdevices, 10(2), 179-186 (2007-09-25)
The majority of microfluidic devices employ networks of channels that have rectangular cross-sections. At the microvascular scale of 30 to 300 microm in diameter, however, the distribution of fluid mechanical stresses and the induced shape of cultured cells will be
Neil Vasdev et al.
Journal of the American Chemical Society, 124(43), 12863-12868 (2002-10-24)
A recent report claims to have prepared [18F]XeF2 by exchange between a large stoichiometric excess of XeF2 and no-carrier-added 18F-, as salts of the [2,2,2-crypt-M+] (M = K or Cs) cations, in CH2Cl2 or CHCl3 solvents at room temperature. Attempts
Tsung Yi Chiang et al.
Journal of synchrotron radiation, 17(1), 69-74 (2009-12-24)
The synchrotron radiation (SR) stimulated etching of silicon elastomer polydimethylsiloxane (PDMS) using XeF(2) as an etching gas has been demonstrated. An etching system with differential pumps and two parabolic focusing mirrors was constructed to perform the etching. The PDMS was
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