254142

Bismuth(III) chloride

99.99% trace metals basis

• Synonyme(s) : Bismuth trichloride, Trichlorobismuth
• Formule empirique (notation de Hill): BiCl₃
• Numéro CAS: 7787-60-2
• Poids moléculaire : 315.34
• Numéro CE : 232-123-2
• Numéro MDL: MFCD00003461
• Code UNSPSC : 12352302
• ID de substance PubChem : 24855360
• Nomenclature NACRES : NA.23

Propriétés

• Niveau de qualité: 100
• Pureté: 99.99% trace metals basis
• Forme: solid
• Pertinence de la réaction: reagent type: catalyst; core: bismuth
• Impuretés: ≤150.0 ppm Trace Metal Analysis
• Point d'ébullition: 447 °C (lit.)
• Pf: 230-232 °C (lit.)
• Chaîne SMILES: Cl[Bi](Cl)Cl
• InChI: 1S/Bi.3ClH/h;3*1H/q+3;;;/p-3
• Clé InChI: JHXKRIRFYBPWGE-UHFFFAOYSA-K

Description

Description générale

Bismuth(III) chloride is a Lewis acid catalyst and a common source of Bi³⁺ ions used in various organic transformations and synthesis of bismuth nanomaterials.

Application

Bismuth(III) chloride can be used:

• As a precursor to prepare polyaniline and bismuth(III) telluride nanohybrids with high thermoelectric performance.
• As a starting material to synthesize visible light absorbing double perovskite semiconductors, such as Cs₂AgBiBr₆ and Cs₂AgBiCl₆, eco-friendly alternative to the lead halide perovskites.
• To form a protective layer on anode materials.

It can also be used as an efficient catalyst for green synthesis of:

• Chalcones by Claisen–Schmidt reaction under solvent-free conditions.
• One-pot three-component synthesis of Propargylamines.
• Coumarins via ultrasound‐assisted Pechmann condensation of phenols with β‐ketoesters.

Informations sur la sécurité

• Pictogrammes: GHS07
• Mention d'avertissement: Warning
• Mentions de danger: H315,H319
• Conseils de prudence: P264 - P280 - P302 + P352 - P305 + P351 + P338 - P332 + P313 - P337 + P313
• Classification des risques: Eye Irrit. 2 - Skin Irrit. 2
• Code de la classe de stockage: 11 - Combustible Solids
• Classe de danger pour l'eau (WGK): WGK 2
• Point d'éclair (°F): Not applicable
• Point d'éclair (°C): Not applicable
• Équipement de protection individuelle: dust mask type N95 (US), Eyeshields, Gloves