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RNase AWAY®

decontamination reagent for RNase

Synonym(s):

Surface Decontaminant

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About This Item

MDL number:
UNSPSC Code:
12352200
NACRES:
NA.52

Quality Level

form

liquid

density

1.000 g/mL at 20 °C

storage temp.

room temp

Related Categories

General description

RNase AWAY® is a ready-to-use surfactant that removes RNA and RNases from lab equipment. Suitable for PCR equipment, plastic, glassware, and stainless steel lab surfaces.

Application

RNase AWAY® has been used:
  • in flow cytometry analysis
  • to sterilize coated microstir bars for the formation of colloidal emulsion
  • to remove RNAse from biosafety cabinet and lab equipment
  • as a chemical to analyse the dynamic transcriptional and epigenetic remodeling during astrogliogenesis

Caution

Gloves should be worn when handling this product. RNase Decontamination Reagent is alkaline in nature and will cause irritation if prolonged contact with the skin is allowed. In case of contact with eyes, immediately flush with water for fifteen minutes and contact a physician. If swallowed, do not induce vomiting. Give plenty of water and contact a physician immediately.

Other Notes

Do not use RNase Decontamination Reagent on aluminium, soft metal or gaskets and seals. This product is not intended as reactant. Do not add to reaction.

Legal Information

AWAY is a registered trademark of Molecular BioProducts, Inc.
RNase AWAY is a registered trademark of Molecular Bio-Products, Inc.

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Pictograms

Corrosion

Signal Word

Warning

Hazard Statements

Hazard Classifications

Eye Irrit. 2 - Met. Corr. 1 - Skin Irrit. 2

Storage Class Code

8B - Non-combustible corrosive hazardous materials

WGK

nwg

Flash Point(F)

Not applicable

Flash Point(C)

Not applicable

Personal Protective Equipment

dust mask type N95 (US), Eyeshields, Gloves

Certificates of Analysis (COA)

Search for Certificates of Analysis (COA) by entering the products Lot/Batch Number. Lot and Batch Numbers can be found on a product’s label following the words ‘Lot’ or ‘Batch’.

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Hultquist JF, et al.
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