773972
Yttrium sputtering target
diam. × thickness 2.00 in. × 0.25 in., 99.9% trace metals basis
Synonym(s):
Yttrium
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About This Item
Empirical Formula (Hill Notation):
Y
CAS Number:
Molecular Weight:
88.91
EC Number:
MDL number:
UNSPSC Code:
12352103
PubChem Substance ID:
NACRES:
NA.23
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Assay
99.9% trace metals basis
form
solid
reaction suitability
core: yttrium
resistivity
57 μΩ-cm, 20°C
diam. × thickness
2.00 in. × 0.25 in.
bp
3338 °C (lit.)
mp
1522 °C (lit.)
density
4.469 g/mL at 25 °C (lit.)
SMILES string
[Y]
InChI
1S/Y
InChI key
VWQVUPCCIRVNHF-UHFFFAOYSA-N
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Application
Solid Oxide Fuel cells operating at temperatures below 800 C (also known as intermediate temperature solid oxide fuel cell, IT-SOFC) are currently the topic of much research and development owing to the high degradation rates and materials costs incurred for SOFC operating at temperatures above 900 C. Thin films of electrode and electrolyte layers is one of the ways to achieve high performances in IT-SOFC.
Yttrium sputtering target can be used for physical vapor deposition of thin films of yttria stabilized zirconia layers for IT-SOFC. Yttrium containing thin films also find applications as thermal barrier and protective coatings, example in thermoelectric devices.
Yttrium sputtering target can be used for physical vapor deposition of thin films of yttria stabilized zirconia layers for IT-SOFC. Yttrium containing thin films also find applications as thermal barrier and protective coatings, example in thermoelectric devices.
Storage Class Code
11 - Combustible Solids
WGK
WGK 3
Flash Point(F)
Not applicable
Flash Point(C)
Not applicable
Certificates of Analysis (COA)
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