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Merck

408964

Sigma-Aldrich

Cyclohexyl methacrylate

≥97%, contains ~60 ppm monomethyl ether hydroquinone as inhibitor

Sinónimos:

Methacrylic acid cyclohexyl ester

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About This Item

Fórmula lineal:
CH2=C(CH3)COOC6H11
Número de CAS:
Peso molecular:
168.23
Beilstein/REAXYS Number:
2045235
EC Number:
MDL number:
UNSPSC Code:
12162002
PubChem Substance ID:
NACRES:
NA.23

assay

≥97%

form

liquid

contains

~60 ppm monomethyl ether hydroquinone as inhibitor

refractive index

n20/D 1.458 (lit.)

bp

68-70 °C/4 mmHg (lit.)

density

0.964 g/mL at 25 °C (lit.)

SMILES string

CC(=C)C(=O)OC1CCCCC1

InChI

1S/C10H16O2/c1-8(2)10(11)12-9-6-4-3-5-7-9/h9H,1,3-7H2,2H3

Inchi Key

OIWOHHBRDFKZNC-UHFFFAOYSA-N

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General description

Cyclohexyl methacrylate(CHMA) is an acrylate monomer with a high-refractive index, commonly used in ultraviolet (UV) curing processes due to its ability to rapidly polymerize under UV light exposure. UV-curable CHMA-based coatings, adhesives, and inks offer fast curing, excellent hardness, hydrophobicity, and high durability. It has good optical clarity, resulting in optical lenses with high transparency and minimal distortion. It can also be used as a crosslinking agent in copolymer systems for dental composites and tissue engineering to enhance the mechanical and thermal properties of the resulting materials.

Application

Cyclohexyl methacrylate can be used:



  • As a monomer to prepare poly(cyclohexyl methacrylate) (PCHMA) thin films for high-performance luminescent solar concentrators(LSCs). These LSCs can be used to fabricate high-quantum yield photovoltaic solar cells.
  • As a comonomer to prepare photo-patternable quantum dot-acrylate resins for fabricating light-emitting diodes with high color transparency.
  • As a monomer to synthesizesuperhydrophobic silica nanoparticle surfaces for various applications such as anti-corrosionsurfaces, drag reduction, and energy conservation.

Pictograms

Exclamation mark

signalword

Warning

Hazard Classifications

Eye Irrit. 2 - Skin Irrit. 2 - Skin Sens. 1 - STOT SE 3

target_organs

Respiratory system

Storage Class

10 - Combustible liquids

wgk_germany

WGK 1

flash_point_f

181.4 °F

flash_point_c

83 °C

ppe

Eyeshields, Gloves, type ABEK (EN14387) respirator filter


Certificados de análisis (COA)

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For most kinds of active polymer optical fibers, a homogeneous distribution of dye molecules over the entire fiber length and cross section is required. In this study, chemical bonding of dyes to poly(methyl methacrylate) (PMMA) by copolymerization is achieved within
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A characteristic effect of a nano-concave-convex structure of a zirconia nanoparticle assembly with an inherent porous structure and huge surface area enabled us to introduce systematic surface modification by thermal treatment to smooth surface and polymer impregnation to mask the

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