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Sigma-Aldrich

Poly(ethylene glycol) dimethacrylate

average MN 20,000, cross-linking reagent polymerization reactions, methacrylate, ≤1, 500 ppm MEHQ as inhibitor (may contain)

Synonyme(s) :

Polyethylene glycol, PEG dimethacrylate

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About This Item

Formule linéaire :
C3H5C(O)(OCH2CH2)nOC(O)C3H5
Numéro CAS:
Numéro MDL:
Code UNSPSC :
12162002
Nomenclature NACRES :
NA.23

product name

Poly(ethylene glycol) dimethacrylate, average Mn 20,000, contains MEHQ as inhibitor

Forme

powder

Poids mol.

average Mn 20,000

Contient

MEHQ as inhibitor
≤1,500 ppm MEHQ as inhibitor (may contain)

Pertinence de la réaction

reagent type: cross-linking reagent
reaction type: Polymerization Reactions

Point d'ébullition

>200 °C/2 mmHg (lit.)

Température de transition

Tm 59-64 °C

Mw/Mn

≤1.1

Extrémité Ω

methacrylate

Extrémité α

methacrylate

Architecture des polymères

shape: linear
functionality: homobifunctional

Température de stockage

−20°C

Chaîne SMILES 

OCCO.CC(=C)C(O)=O

InChI

1S/C10H14O4/c1-7(2)9(11)13-5-6-14-10(12)8(3)4/h1,3,5-6H2,2,4H3

Clé InChI

STVZJERGLQHEKB-UHFFFAOYSA-N

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Notes préparatoires

Synthesized with an initial concentration of ≤1,500 ppm MEHQ

Code de la classe de stockage

11 - Combustible Solids

Classe de danger pour l'eau (WGK)

WGK 1


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C Aulin et al.
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Articular cartilage has a limited capacity for self-repair in adult humans, and methods used to stimulate regeneration often result in re-growth of fibrous cartilage, which has lower durability. No current treatment option can provide complete repair. The possibility of growth
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Scaffold patterning with poly(ethylene glycol)-based hydrogels for cell presence in 2D and 3D environments on photoactive substrates.

Scaffold patterning with poly(ethylene glycol)-based hydrogels for cell presence in 2D and 3D environments on photoactive substrates.

Scaffold patterning with poly(ethylene glycol)-based hydrogels for cell presence in 2D and 3D environments on photoactive substrates.

Scaffold patterning with poly(ethylene glycol)-based hydrogels for cell presence in 2D and 3D environments on photoactive substrates.

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