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GF64202677

Nickel

foil, not light tested, 25x25mm, thickness 0.003mm, 99.95%

Synonym(s):

Nickel, NI000215

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About This Item

Empirical Formula (Hill Notation):
Ni
CAS Number:
7440-02-0
Molecular Weight:
58.69
MDL number:
MFCD00011137
UNSPSC Code:
12141729
PubChem Substance ID:
329809685
NACRES:
NA.23

Assay

99.95%

form

foil

manufacturer/tradename

Goodfellow 642-026-77

resistivity

6.97 μΩ-cm, 20°C

size × thickness

25x25 mm × 0.003 mm

bp

2732 °C (lit.)

mp

1453 °C (lit.)

density

8.9 g/mL at 25 °C (lit.)

SMILES string

[Ni]

InChI

1S/Ni

InChI key

PXHVJJICTQNCMI-UHFFFAOYSA-N

General description

For updated SDS information please visit www.goodfellow.com.

Legal Information

Product of Goodfellow

Pictograms

Health hazardExclamation mark
GHS08,GHS07

Signal Word

Danger

Hazard Statements

H317,H351,H372

Hazard Classifications

Carc. 2 - Skin Sens. 1 - STOT RE 1

Storage Class Code

6.1D - Non-combustible acute toxic Cat.3 / toxic hazardous materials or hazardous materials causing chronic effects

WGK

WGK 1

Flash Point(F)

Not applicable

Flash Point(C)

Not applicable

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L A van Loon et al.
Journal of oral pathology, 17(3), 129-137 (1988-03-01)
An in vivo comparison was made between the contact allergic stomatitis-inducing capacity of nickel, nickel-containing dental alloys and a non-corrosive precious metal. Fifteen patients with a positive allergic skin reaction to nickel were divided into 3 groups (A, B and
H T Tien et al.
Photochemistry and photobiology, 49(5), 527-530 (1989-05-01)
Visible light of the solar spectrum is directly converted to stored chemical energy of hydrogen from artificial sea water in a novel electrochemical photovoltaic cell. The principal element of the cell, modeled after the photosynthetic thylakoid membrane, is a semiconductor
Gareth E Haslam et al.
Physical chemistry chemical physics : PCCP, 13(28), 12968-12974 (2011-06-23)
Metallic nickel is a powerful electrocatalyst in alkaline solution and is able to be used in the alkaline fuel cell. However, in acidic solution, electrocatalysis is impossible because the metal is subject to rapid corrosion at low pH for all
Y Kim et al.
Applied physics letters, 98(26), 263106-2631063 (2011-07-30)
Microwave plasma chemical vapor deposition (MPCVD) was employed to synthesize high quality centimeter scale graphene film at low temperatures. Monolayer graphene was obtained by varying the gas mixing ratio of hydrogen and methane to 80:1. Using advantages of MPCVD, the
G E van Dorssen et al.
Journal of X-ray science and technology, 3(2), 109-117 (1992-01-01)
The structure of Ni-C multilayer and single nickel layer samples has been analyzed before and after annealing, using two techniques: fluorescence EXAFS (F1EXAFS) at the Ni-K. edge and CuKα reflection. Annealing at a temperature of 450°C resulted in a change
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