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573515

Sigma-Aldrich

Germanium(II) chloride dioxane complex (1:1)

Synonym(s):

Dioxanedichlorogermylene, Germanium dichloride-dioxane

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About This Item

Empirical Formula (Hill Notation):
C4H8Cl2GeO2
CAS Number:
28595-67-7
Molecular Weight:
231.65
UNSPSC Code:
12352302
PubChem Substance ID:
24880680
NACRES:
NA.23

form

solid

Quality Level

200

reaction suitability

reagent type: catalyst
core: germanium

concentration

25.3-35.8% (silver nitrate titration)

SMILES string

Cl[Ge]Cl.C1COCCO1

InChI

1S/C4H8O2.Cl2Ge/c1-2-6-4-3-5-1;1-3-2/h1-4H2;

InChI key

NYMJLNHIEKAQSD-UHFFFAOYSA-N

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General description

Germanium(II) chloride dioxane complex (1:1) is an organometallic compound used as a reductant in organic synthesis, and to prepare other germanium-based nanoparticles and complexes.

Application

Germanium(II) chloride dioxane complex (1:1) can be used as a precursor:
  • To synthesize Germanium oxide nanoparticles.
  • To prepare a heterocyclic germylene complex that can be used as an atomic layer deposition precursor to fabricate germanium thin films.
It can also be used as a reductant in various organic transformations.

Signal Word

Danger

Hazard Statements

H314,H332,H351

Hazard Classifications

Acute Tox. 4 Inhalation - Carc. 2 - Skin Corr. 1B

Storage Class Code

8A - Combustible corrosive hazardous materials

WGK

WGK 3

Flash Point(F)

Not applicable

Flash Point(C)

Not applicable

Personal Protective Equipment

dust mask type N95 (US), Eyeshields, Gloves

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Certificates of Analysis (COA)

Lot/Batch Number
MKCW1579
MKCV3108
MKCT0891
MKCT0251
MKCQ6965

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Reduction Properties Of Germanium Dichloride With Respect To The Redox-Active Monoiminoacenaphtenone Dpp-Mian}
AN Lukoyanov, et al.
Journal of Structural Chemistry, 64, 288-301 (2023)
From rational design of organometallic precursors to optimized synthesis of core/shell Ge/GeO 2 nanoparticles
D Matioszek, et al.
Dalton Transactions, 44, 7242-7250 (2015)
Synthesis of N-heterocyclic stannylene (Sn (II)) and germylene (Ge (II)) and a Sn (II) amidinate and their application as precursors for atomic layer deposition
Sang Bok Kim, et al.
Chemistry of Materials, 26, 3065-3073 (2014)

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