317004
Tantalum(V) fluoride
98%
Synonym(s):
Tantalum pentafluoride
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About This Item
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Quality Level
Assay
98%
form
powder
reaction suitability
reagent type: catalyst
core: tantalum
density
4.74 g/mL at 25 °C (lit.)
SMILES string
F[Ta](F)(F)(F)F
InChI
1S/5FH.Ta/h5*1H;/q;;;;;+5/p-5
InChI key
YRGLXIVYESZPLQ-UHFFFAOYSA-I
General description
Tantalum(V) fluoride is a volatile inorganiccompound widely used as a precursor for atomic layer deposition, to producemetal fluoride thin films and as a catalyst in various organic transformations.
Application
Tantalum(V) fluoride can be used:
- As a precursor for atomic layer deposition of thin films on the cathode materials of Li-ion batteries.
- As a dopant to enhance the photochemical activity of hematite by improving charge carrier mobility and reducing recombination of photogenerated holes and electrons.
- To enhance the photocurrent stability and photoluminescence of WO3 films (used as photoelectrode for photolysis of water).
- As a catalyst for N-alkylation of arylamines with benzylalcohols.
Signal Word
Danger
Hazard Statements
Precautionary Statements
Hazard Classifications
Eye Dam. 1 - Skin Corr. 1B
Storage Class Code
8B - Non-combustible corrosive hazardous materials
WGK
WGK 3
Flash Point(F)
Not applicable
Flash Point(C)
Not applicable
Personal Protective Equipment
dust mask type N95 (US), Eyeshields, Gloves
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Improvement of Hematite as Photocatalyst by Doping with Tantalum
The Journal of Physical Chemistry C, 118, 16842-16850 (2014)
Influence of tantalum dopant ions (Ta5+) on the efficiency of the tungsten trioxide photoelectrode
Physica Status Solidi (A): Applied Research, 205, 2038-2041 (2008)
Applications and Advantages of Atomic Layer Deposition for Lithium-Ion Batteries Cathodes
Lithium-Ion Batteries, 8, 184-184 (2022)
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