235687
Hexamethylcyclotrisiloxane
98%
Synonym(s):
Cyclic (D3) permethylsiloxane
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25 G
€42.20
100 G
€96.80
About This Item
Empirical Formula (Hill Notation):
C6H18O3Si3
CAS Number:
Molecular Weight:
222.46
EC Number:
MDL number:
UNSPSC Code:
12352103
PubChem Substance ID:
NACRES:
NA.22
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vapor density
1 (vs air)
Quality Level
Assay
98%
form
solid
bp
134 °C (lit.)
mp
50-64 °C (lit.)
SMILES string
C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O1
InChI
1S/C6H18O3Si3/c1-10(2)7-11(3,4)9-12(5,6)8-10/h1-6H3
InChI key
HTDJPCNNEPUOOQ-UHFFFAOYSA-N
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Application
Hexamethylcyclotrisiloxane (D3) can be used in the synthesis of:
- Polysiloxanes by anionic ring-opening polymerization.[1]
- Thin films by pulsed- plasma-enhanced chemical vapor deposition (PECVD) for the application of insulating biomaterials.[2]
- Dimethoxydimethylsilane by treating with dimethyl carbonate via deoligomerization using alkali metal hydroxide catalyst.[3]
Signal Word
Danger
Hazard Statements
Precautionary Statements
Hazard Classifications
Flam. Sol. 1
Storage Class Code
4.1B - Flammable solid hazardous materials
WGK
WGK 3
Flash Point(F)
95.0 °F - closed cup
Flash Point(C)
35 °C - closed cup
Personal Protective Equipment
dust mask type N95 (US), Eyeshields, Gloves
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A S Chawla
Biomaterials, 2(2), 83-88 (1981-04-01)
Silicone coated Celgard-2400 and Silastic membranes were prepared by plasma polymerization of hexamethylcyclotrisiloxane. The adhesion of canine platelets and leucocytes was tested by passing whole blood from the anaesthetized mongrel dog in an ex-vivo shunt system. The silicone control Celgard
Living anionic polymerization of hexamethylcyclotrisiloxane (D3) using functionalized initiation.
Elkins C L and Long T E
Macromolecules, 37(17), 6657-6659 (2004)
Anionic polymerization of hexamethylcyclotrisiloxane with acetylacetone initiator to form telechelic polymer
Kumar A and Eichinger BE
Macromolecules, 23(26), 5358-5358 (1990)
Elisabetta Finocchio et al.
Chemosphere, 72(11), 1659-1663 (2008-07-08)
The decomposition of hexamethylcyclotrisiloxane (HMCTS) has been studied at room temperature and in the range 473-673 K over the surface of basic (CaO, MgO) and acidic oxides (Al(2)O(3), SiO(2)). Alumina allows the complete removal of HMCTS from synthetic biogases at
Robust block copolymer mask for nanopatterning polymer films.
Chao C C, et al.
ACS Nano, 4(4), 2088-2094 (2010)
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