All Photos(1)
About This Item
Empirical Formula (Hill Notation):
H2O2
CAS Number:
Molecular Weight:
34.01
Beilstein:
3587191
MDL number:
UNSPSC Code:
12352304
PubChem Substance ID:
vapor pressure
23.3 mmHg ( 30 °C)
Assay
≥30%
CofA
specification on request
shelf life
~2 yr
reaction suitability
reagent type: oxidant
concentration
25-35%
density
1.110 g/cm3
storage temp.
2-8°C
SMILES string
OO
InChI
1S/H2O2/c1-2/h1-2H
InChI key
MHAJPDPJQMAIIY-UHFFFAOYSA-N
Looking for similar products? Visit Product Comparison Guide
General description
Hydrogen peroxide is a strong oxidizer. It may be produced industrially by anthraquinone oxidation. it is used in semiconductor industry essentially for cleaning silicon wafers, removal of photoresists and to etch metallic copper on printed circuit boards. Ultrapurification of hydrogen peroxide by reverse osmosis has been reported in detail.
Application
Semiconductor grade hydrogen peroxide was used to etch TiN 2 and GaAs structures.
Legal Information
PURANAL is a trademark of Honeywell Specialty Chemicals Seelze GmbH
Signal Word
Danger
Hazard Statements
Precautionary Statements
Hazard Classifications
Aquatic Chronic 3 - Eye Dam. 1
Storage Class Code
5.1B - Oxidizing hazardous materials
WGK
WGK 1
Flash Point(F)
Not applicable
Flash Point(C)
Not applicable
Personal Protective Equipment
dust mask type N95 (US), Eyeshields, Gloves
Choose from one of the most recent versions:
Already Own This Product?
Find documentation for the products that you have recently purchased in the Document Library.
Our team of scientists has experience in all areas of research including Life Science, Material Science, Chemical Synthesis, Chromatography, Analytical and many others.
Contact Technical Service