398055

Succinic acid

ACS reagent, ≥99.0%

• Synonym(s): Butanedioic acid
• Linear Formula: HOOCCH₂CH₂COOH
• CAS Number: 110-15-6
• Molecular Weight: 118.09
• Beilstein: 1754069
• EC Number: 203-740-4
• MDL number: MFCD00002789
• UNSPSC Code: 12352100
• PubChem Substance ID: 24864715
• NACRES: NA.21

Properties

• grade: ACS reagent
• Quality Level: 200
• Assay: ≥99.0%
• impurities: ≤0.001% N compounds; ≤0.01% insolubles
• ign. residue: ≤0.02%
• bp: 235 °C (lit.)
• mp: 184-186 °C (lit.)
• solubility: water: soluble 83 g/L at 25 °C
• anion traces: chloride (Cl^-): ≤0.001%; phosphate (PO₄^3-): ≤0.001%; sulfate (SO₄^2-): ≤0.003%
• cation traces: Fe: ≤5 ppm; heavy metals (as Pb): ≤5 ppm
• functional group: carboxylic acid
• SMILES string: OC(=O)CCC(O)=O
• InChI: 1S/C4H6O4/c5-3(6)1-2-4(7)8/h1-2H2,(H,5,6)(H,7,8)
• InChI key: KDYFGRWQOYBRFD-UHFFFAOYSA-N

Description

General description

Succinic acid, an organic acid is an important building block that has a wide range of synthetic applications. Presently it is synthesized from petrochemical compounds. Due to its increasing demand many bio-based methods have been proposed for its synthesis as an efficient alternative. Its utility as a low shrinkage additive (LSA) in unsaturated polyester resin (UPR) has been investigated.

Application

Succinic acid may be used in the following processes:

• As a leaching agent in extracting lithium (Li), cobalt from used Li-ion batteries and magnesium from magnesite ore.
• Synthesis of new elastic polyesters.
• As a cocrystallising agent in the synthesis of cocrystals with organic molecules.

Other Notes

Go to Redi-Dri^™ Product Listing 797987

Legal Information

Redi-Dri is a trademark of Sigma-Aldrich Co. LLC

Safety Information

• Pictograms: GHS05
• Signal Word: Danger
• Hazard Statements: H318
• Precautionary Statements: P280 - P305 + P351 + P338
• Hazard Classifications: Eye Dam. 1
• Storage Class Code: 11 - Combustible Solids
• WGK: WGK 1
• Flash Point(F): Not applicable
• Flash Point(C): Not applicable
• Personal Protective Equipment: dust mask type N95 (US), Eyeshields, Gloves