Skip to Content
Merck
All Photos(1)

Key Documents

View All Documentation

553131

Sigma-Aldrich

Tetrakis(ethylmethylamido)zirconium(IV)

≥99.99% trace metals basis

Synonym(s):

TEMAZ, Tetrakis(ethylmethylamino)zirconium(IV)

Sign Into View Organizational & Contract Pricing
All Photos(1)

About This Item

Linear Formula:
Zr(NCH3C2H5)4
CAS Number:
175923-04-3
Molecular Weight:
323.63
MDL number:
MFCD03427131
UNSPSC Code:
12352103
PubChem Substance ID:
24879307
NACRES:
NA.23

Quality Level

200

Assay

≥99.99% trace metals basis

form

liquid

reaction suitability

core: zirconium

bp

81 °C/0.1 mmHg (lit.)

density

1.049 g/mL at 25 °C (lit.)

SMILES string

CCN(C)[Zr](N(C)CC)(N(C)CC)N(C)CC

InChI

1S/4C3H8N.Zr/c4*1-3-4-2;/h4*3H2,1-2H3;/q4*-1;+4

InChI key

SRLSISLWUNZOOB-UHFFFAOYSA-N

Looking for similar products? Visit Product Comparison Guide

Application

Tetrakis(ethylmethylamido)zirconium(IV) can be used as a precursor for atomic layer deposition of zirconium fluoride. These metal fluorides are applied in the field of catalysis, optical films, and protective coatings for Li-ion battery electrodes.

accessory

Product No.
Description
Pricing

Pictograms

FlameExclamation mark
GHS02,GHS07

Signal Word

Danger

Hazard Statements

H225,H261,H315,H319,H335

Hazard Classifications

Eye Irrit. 2 - Flam. Liq. 2 - Skin Irrit. 2 - STOT SE 3 - Water-react 2

Target Organs

Respiratory system

Storage Class Code

4.3 - Hazardous materials which set free flammable gases upon contact with water

WGK

WGK 3

Flash Point(F)

50.0 °F - closed cup

Flash Point(C)

10 °C - closed cup

Personal Protective Equipment

dust mask type N95 (US), Eyeshields, Gloves

Choose from one of the most recent versions:

Certificates of Analysis (COA)

Lot/Batch Number
SHBN5343
SHBM5511
SHBL3495
SHBF6263V
SHBD9953V

Don't see the Right Version?

If you require a particular version, you can look up a specific certificate by the Lot or Batch number.

Search for a COA

Already Own This Product?

Find documentation for the products that you have recently purchased in the Document Library.

Visit the Document Library

Atomic layer deposition of metal fluorides using HF-pyridine as the fluorine precursor
Younghee Lee, et al.
Chemistry of Materials, 28, 2022-2032 (2016)
ZrO2 monolayer as a removable etch stop layer for thermal Al2O3 atomic layer etching using hydrogen fluoride and trimethylaluminum
David R Zywotko, et al.
Chemistry of Materials, 32, 10055-10065 (2020)

Our team of scientists has experience in all areas of research including Life Science, Material Science, Chemical Synthesis, Chromatography, Analytical and many others.

Contact Technical Service