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316989

Sigma-Aldrich

Hydrogen peroxide solution

contains potassium stannate as inhibitor, 30-32 wt. % in water, semiconductor grade, 99.999% trace metals basis

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About This Item

Empirical Formula (Hill Notation):
H2O2
CAS Number:
Molecular Weight:
34.01
Beilstein:
3587191
MDL number:
UNSPSC Code:
12352300
PubChem Substance ID:

vapor density

1 (vs air)

vapor pressure

23.3 mmHg ( 30 °C)

Assay

99.999% trace metals basis

form

liquid

contains

potassium stannate as inhibitor
stabilizer

reaction suitability

reagent type: oxidant

concentration

30-32 wt. % in water, semiconductor grade

density

1.11 g/mL at 25 °C

storage temp.

2-8°C

SMILES string

OO

InChI

1S/H2O2/c1-2/h1-2H

InChI key

MHAJPDPJQMAIIY-UHFFFAOYSA-N

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General description

Hydrogen peroxide solution is a widely used oxidizing agent in a variety of applications, including the oxidation of cyanide in industrial waste samples, the removal of ammonia from semiconductor wastewater, the removal of ibuprofen from water and wastewater, and the treatment of wastewater containing five-membered heterocyclic pyrazoles. It is one of the most widely used wet electronic chemicals.

Application

Hydrogen peroxide solution can be used in the substrate preparation for ultrathin polymer films.

Pictograms

Corrosion

Signal Word

Danger

Hazard Statements

Hazard Classifications

Aquatic Chronic 3 - Eye Dam. 1

Storage Class Code

5.1B - Oxidizing hazardous materials

WGK

WGK 1

Flash Point(F)

Not applicable

Flash Point(C)

Not applicable

Personal Protective Equipment

dust mask type N95 (US), Eyeshields, Gloves

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Yang J, et al.
Age (Dordrecht, Netherlands), 35(1), 11-22 (2013)
Integrated countercurrent reverse osmosis cascades for hydrogen peroxide ultrapurification
Abejon R, et al.
Computers & Chemical Engineering, 41, 67-76 (2012)
Photochemical reduction of gold (III) on semiconductor dispersions of TiO2 in the presence of CN- ions: disposal of CN- by treatment with hydrogen peroxide
Serpone N, et al.
Journal of Photochemistry, 36, 373-388 (1987)
Fabrication of large-area free-standing ultrathin polymer films
Stadermann M, et al.
Journal of Visualized Experiments, e52832-e52832 (2015)
Enhanced electrochemical oxidation process with hydrogen peroxide pretreatment for removal of high strength ammonia from semiconductor wastewater
Chung S, et al.
Journal of Water Process Engineering, 37, 101425-101425 (2020)

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