651826

Chromium etchant

standard

• Synonyme(s) : Cr etching solution
• Numéro MDL: MFCD07370678
• Code UNSPSC : 12352300
• Nomenclature NACRES : NA.23

Propriétés

• Qualité: standard
• Composition: volatiles, 85%
• Couleur: orange
• Point d'ébullition: 100 °C/1 atm
• Densité: 1.16 g/mL at 25 °C

Description

Description générale

• Appearance - Clear orange
• pH - Acidic
• Etch Rate at 40 °C - 40 Å/second
• Etch Capacity (rate declines at ~70%) - 65 g/gallon
• Shelf Life - 1 year
• Storage Conditions - Ambient
• Filtration - 0.2 µm
• Recommended Operating Temperatures - 20-80 °C (30-40 °C most common)
• Rinse - Deionized water
• Photoresist Recommendations - KLT6000 Series, KLT 5300 Series, HARE SQT (SU-8 type), TRANSIST, or PKP -308PI
• Select Compatible Materials - Au, Ti, oxide, nitride, Si
• Select Incompatible Materials - Al, Ni, Cu, NiCr
• Compatible Plastics - HDPE, PP, PTFE, PFA, PVC
• Isotropy - Isotropic
• Incompatible Chemicals - Strong bases

Ceric ammonium nitrate-based etchant. Etch rate of 40 Å/sec @ room temp. Etches cleanly with only a deionized water rinse needed.

Chromium etchant is a chromium based solution that removes the excess metal from the substrate. These etchants are majorly used in metal finishing and electronic industry. It has an etch rate of 4 mm/s and can be used to etch nickel, copper, and chromium based excess metals.

Our chromium etchant is high purity ceric ammonium nitrate system for precise, clean etching of chromium and chromium oxide films. Compatible with positive and negative photoresists. Our chromium etchant is filtered to remove all particulates above 0.2 microns. Etching temperature varies depending on film thickness. Etch times range from 15 seconds to 60 seconds at room temperature. Chromium Etchants should be operated in a well-ventilated hood.

Application

The product can etch Al, Cr, Cu, Ni, GaAs. It can surface oxidize Si, Ta/TaN, however, it has no effect on Au, Si₃N₄, SiO₂, Ti, and W surfaces

For use at room temperature or elevated temperature. Etches cleanly, eliminating need for an intermediate rinse. Etching temperature varies with regard to film thickness. Etch times range from 15 to 60 seconds at room temperature. Note, chromium etchants should be handled in a well ventilated hood.

Caractéristiques et avantages

Designed for precise, clean etching of chromium and chromium oxide films. Compatible with both positive and negative photoresists. Filtered to 0.2 micron to remove particlulates.

Informations sur la sécurité

• Pictogrammes: GHS03,GHS05,GHS07,GHS09
• Mention d'avertissement: Danger
• Mentions de danger: H272,H290,H314,H317,H411
• Conseils de prudence: P210 - P220 - P273 - P280 - P303 + P361 + P353 - P305 + P351 + P338
• Classification des risques: Aquatic Chronic 2 - Eye Dam. 1 - Met. Corr. 1 - Ox. Liq. 2 - Skin Corr. 1B - Skin Sens. 1
• Risques supp: EUH071
• Code de la classe de stockage: 5.1B - Oxidizing hazardous materials
• Classe de danger pour l'eau (WGK): WGK 3
• Point d'éclair (°F): Not applicable
• Point d'éclair (°C): Not applicable