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Sigma-Aldrich

Hydrogen peroxide solution

semiconductor grade MOS PURANAL™ (Honeywell 17937), ≥30%

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About This Item

Empirical Formula (Hill Notation):
H2O2
CAS Number:
7722-84-1
Molecular Weight:
34.01
Beilstein:
3587191
MDL number:
MFCD00011333
UNSPSC Code:
12352304
PubChem Substance ID:
57649964

grade

semiconductor grade MOS PURANAL™ (Honeywell 17937)

vapor pressure

23.3 mmHg ( 30 °C)

Assay

≥30%

CofA

specification on request

shelf life

~2 yr

reaction suitability

reagent type: oxidant

concentration

25-35%

density

1.110 g/cm3

storage temp.

2-8°C

SMILES string

OO

InChI

1S/H2O2/c1-2/h1-2H

InChI key

MHAJPDPJQMAIIY-UHFFFAOYSA-N

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General description

Hydrogen peroxide is a strong oxidizer. It may be produced industrially by anthraquinone oxidation. it is used in semiconductor industry essentially for cleaning silicon wafers, removal of photoresists and to etch metallic copper on printed circuit boards. Ultrapurification of hydrogen peroxide by reverse osmosis has been reported in detail.

Application

Semiconductor grade hydrogen peroxide was used to etch TiN 2 and GaAs structures.

Legal Information

PURANAL is a trademark of Honeywell Specialty Chemicals Seelze GmbH

Pictograms

Corrosion
GHS05

Signal Word

Danger

Hazard Statements

H318,H412

Hazard Classifications

Aquatic Chronic 3 - Eye Dam. 1

Storage Class Code

5.1B - Oxidizing hazardous materials

WGK

WGK 1

Flash Point(F)

Not applicable

Flash Point(C)

Not applicable

Personal Protective Equipment

dust mask type N95 (US), Eyeshields, Gloves

Certificates of Analysis (COA)

Search for Certificates of Analysis (COA) by entering the products Lot/Batch Number. Lot and Batch Numbers can be found on a product’s label following the words ‘Lot’ or ‘Batch’.

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Localized GaAs etching with acidic hydrogen peroxide solutions
Shaw DW, et al.
Journal of the Electrochemical Society, 128(4), 874-880 (1981)
Ultrapurification of hydrogen peroxide solution from ionic metals impurities to semiconductor grade by reverse osmosis.
Abejon R, et al.
Separation and Purification Technology, 76(1), 44-51 (2010)
Jose M Campos-Martin et al.
Angewandte Chemie (International ed. in English), 45(42), 6962-6984 (2006-10-14)
Hydrogen peroxide (H2O2) is widely used in almost all industrial areas, particularly in the chemical industry and environmental protection. The only degradation product of its use is water, and thus it has played a large role in environmentally friendly methods
Shoichi Iriguchi et al.
Blood, 125(2), 370-382 (2014-10-29)
Although overexpression of T-bet, a master transcription factor in type-1 helper T lymphocytes, has been reported in several hematologic and immune diseases, its role in their pathogenesis is not fully understood. In the present study, we used transgenic model mice
Esther P M Tjin et al.
Cancer immunology research, 2(6), 538-546 (2014-06-05)
In this study, we investigated a large series of immune (escape) markers, relevant to T-cell function, as potential biomarkers for clinical outcome following immunotherapy. We retrospectively studied the expression of immune (escape) markers in metastatic melanoma tissues of 27 patients
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