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371904

Sigma-Aldrich

1,3-Divinyltetramethyldisiloxane

97%

Synonym(s):

1,1,3,3-Tetramethyl-1,3-divinyldisiloxane

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About This Item

Linear Formula:
[H2C=CHSi(CH3)2]2O
CAS Number:
2627-95-4
Molecular Weight:
186.40
Beilstein:
1762585
EC Number:
220-099-6
MDL number:
MFCD00014933
UNSPSC Code:
12162002
PubChem Substance ID:
24863134
NACRES:
NA.23

Assay

97%

form

liquid

refractive index

n20/D 1.411 (lit.)

bp

139 °C (lit.)

mp

−99 °C (lit.)

density

0.809 g/mL at 25 °C (lit.)

SMILES string

C[Si](C)(O[Si](C)(C)C=C)C=C

InChI

1S/C8H18OSi2/c1-7-10(3,4)9-11(5,6)8-2/h7-8H,1-2H2,3-6H3

InChI key

BITPLIXHRASDQB-UHFFFAOYSA-N

Application


  • Synthesis and Studies on the Effect of Phenyl Side–Chain Content on Refractive Index of Polysiloxane Resin: This study used 1,3-divinyltetramethyldisiloxane as a terminating agent to modify polysiloxane resin properties (Ramli et al., 2015).

  • Undecenoic Acid-Based Polydimethylsiloxanes Obtained by Hydrosilylation and Hydrothiolation Reactions: This paper explored the use of 1,3-divinyltetramethyldisiloxane as a blocking agent in the synthesis of polydimethylsiloxanes (Milenin et al., 2020).

  • Efficient Improvement in Electrochemical Properties of High-Voltage Li-rich Mn-Based Layered Oxide Cathode by Addition of 1,3-divinyltetramethyldisiloxane: The additive 1,3-divinyltetramethyldisiloxane was used to enhance electrochemical properties of Li-rich layered oxide cathode (Huang et al., 2023).

Pictograms

Flame
GHS02

Signal Word

Danger

Hazard Statements

H225

Hazard Classifications

Flam. Liq. 2

Storage Class Code

3 - Flammable liquids

WGK

WGK 3

Flash Point(F)

71.1 °F - closed cup

Flash Point(C)

21.7 °C - closed cup

Personal Protective Equipment

dust mask type N95 (US), Eyeshields, Gloves

Certificates of Analysis (COA)

Search for Certificates of Analysis (COA) by entering the products Lot/Batch Number. Lot and Batch Numbers can be found on a product’s label following the words ‘Lot’ or ‘Batch’.

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Seungmin Shin et al.
Nanotechnology, 27(47), 475301-475301 (2016-10-27)
Novel polyhedral oligomeric silsesquioxane (POSS) resists, which are based on a new photo-crosslinking system via Wolff rearrangement, are developed as ideal replica mold materials for ultraviolet-nanoimprint lithography. These POSS resist materials are synthesized by incorporating diazoketo and hydroxyl groups into
B Sivaranjini et al.
Scientific reports, 8(1), 8891-8891 (2018-06-13)
A simple and effective approach for vertical alignment of liquid crystals (LCs) over a functionalized transparent flexible substrate is described. Surface characterization of this commercially available plastic substrate through X-ray photoelectron spectroscopy (XPS) and attenuated total reflection infrared spectroscopy (ATR-IR)
Ilya Borisov et al.
Polymers, 12(6) (2020-05-30)
For the first time, the effect of the side-chain in polyalkylmethylsiloxane towards pervaporative removal of methyl tert-butyl ether (MTBE) from water was studied. The noticeable enhancement of separation factor during the pervaporation of 1 wt.% MTBE solution in water through
Charles A Ault et al.
Macromolecular rapid communications, 42(5), e2000692-e2000692 (2021-01-28)
Effects of molecular weight of methylphenyl-containing vinylsiloxy-functionalized terpolysiloxanes on their UV-activated crosslinking by hydrosilylation at room temperature in air, shelf life stability of "all-in-one" pastes prepared from them for additive manufacturing, and mechanical properties of the resulting crosslinked elastomers, are
Katharina Thum et al.
Chemistry (Weinheim an der Bergstrasse, Germany), 27(7), 2513-2522 (2020-11-17)
The first intermolecular early main group metal-alkene complexes were isolated. This was enabled by using highly Lewis acidic Mg centers in the Lewis base-free cations (Me BDI)Mg+ and (tBu BDI)Mg+ with B(C6 F5 )4 - counterions (Me BDI=CH[C(CH3 )N(DIPP)]2

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