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Sigma-Aldrich

Hexamethyldisiloxane

NMR grade, ≥99.5%

Synonym(s):

HMDSO

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About This Item

Linear Formula:
(CH3)3SiOSi(CH3)3
CAS Number:
Molecular Weight:
162.38
Beilstein:
1736258
EC Number:
MDL number:
UNSPSC Code:
12352103
PubChem Substance ID:
NACRES:
NA.22

grade

NMR grade

vapor density

>1 (vs air)

Assay

≥99.5%

form

liquid

technique(s)

NMR: suitable

refractive index

n20/D 1.377 (lit.)

bp

101 °C (lit.)

mp

−59 °C (lit.)

density

0.764 g/mL at 20 °C (lit.)

SMILES string

C[Si](C)(C)O[Si](C)(C)C

InChI

1S/C6H18OSi2/c1-8(2,3)7-9(4,5)6/h1-6H3

InChI key

UQEAIHBTYFGYIE-UHFFFAOYSA-N

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Pictograms

FlameEnvironment

Signal Word

Danger

Hazard Statements

Precautionary Statements

Hazard Classifications

Aquatic Acute 1 - Aquatic Chronic 1 - Flam. Liq. 2

Storage Class Code

3 - Flammable liquids

WGK

WGK 2

Flash Point(F)

21.2 °F - closed cup

Flash Point(C)

-6 °C - closed cup

Personal Protective Equipment

dust mask type N95 (US), Eyeshields, Gloves

Certificates of Analysis (COA)

Search for Certificates of Analysis (COA) by entering the products Lot/Batch Number. Lot and Batch Numbers can be found on a product’s label following the words ‘Lot’ or ‘Batch’.

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Journal of oral rehabilitation, 33(10), 775-783 (2006-08-30)
It has been suggested that altering the surface properties of acrylic resin material may change the nature of the adsorbed pellicle affecting denture retention and microbial adherence. This study aimed at evaluating the adsorption of salivary high molecular-weight mucins, a
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Biomedical materials (Bristol, England), 4(4), 045002-045002 (2009-06-16)
This study investigated the influence of surface wettability on competitive protein adsorption and the initial attachment of osteoblasts. A thin-film coating of hexamethyldisiloxane (HMDSO) and subsequent O(2)-plasma treatment was carried out on substrates with a mirror surface in order to
Yuan-Kai Cheng et al.
Journal of chromatography. A, 1220, 143-146 (2011-12-24)
The Hadamard transform-gas chromatography/mass spectrometry (HT-GC/MS) technique was successfully employed for the detection of hexamethyldisiloxane (HMDSO, C(6)H(18)OSi(2)) at the sub-nL/L level in a semiconductor wafer cleanroom. Indoor air samples were collected from the room, according to EPA Method TO-17 using

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