Tantalum(V) fluoride is a volatile inorganiccompound widely used as a precursor for atomic layer deposition, to producemetal fluoride thin films and as a catalyst in various organic transformations.
Application
Tantalum(V) fluoride can be used:
As a precursor for atomic layer deposition of thin films on the cathode materials of Li-ion batteries.[1]
As a dopant to enhance the photochemical activity of hematite by improving charge carrier mobility and reducing recombination of photogenerated holes and electrons.[2]
To enhance the photocurrent stability and photoluminescence of WO3 films (used as photoelectrode for photolysis of water).[3]
As a catalyst for N-alkylation of arylamines with benzylalcohols.
Influence of tantalum dopant ions (Ta5+) on the efficiency of the tungsten trioxide photoelectrode
A Enesca, et al.
Physica Status Solidi (A): Applied Research, 205, 2038-2041 (2008)
Improvement of Hematite as Photocatalyst by Doping with Tantalum
Xinsheng Zhang, et al.
The Journal of Physical Chemistry C, 118, 16842-16850 (2014)
Applications and Advantages of Atomic Layer Deposition for Lithium-Ion Batteries Cathodes
Yury Koshtyal, et al.},
Lithium-Ion Batteries, 8, 184-184 (2022)
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