The product is polycrystalline, not a single crystal. It contains thin layers of native SiO2 and Titanium (Ti) between the Si and gold. These SiO2 and Ti adhesion layers are used to bind gold to the silicon surface, and the nominal thickness of the titanium film is 50 Angstroms. The supplier does not remove the SiO2 layer and does not recommend the customer to remove it.
643262
Gold coated silicon wafer
99.999% (Au), layer thickness 1000 Å, 99.99% (Ti)
Synonym(s):
gold coated silicon, gold coated wafer
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About This Item
Linear Formula:
Au
Molecular Weight:
196.97
MDL number:
UNSPSC Code:
12352103
PubChem Substance ID:
NACRES:
NA.23
Pricing and availability is not currently available.
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Quality Level
Assay
99.99% (Ti)
99.999% (Au)
diam. × thickness
4 in. × 500 μm
layer thickness
1000 Å
matrix attachment
Titanium, as adhesion layer used to bind the gold to the silicon wafer.
SMILES string
[Au]
InChI
1S/Au
InChI key
PCHJSUWPFVWCPO-UHFFFAOYSA-N
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General description
Our gold-coated silicon wafers use electron-beam lithography to form amorphous layers (50Å of titanium followed by 1000Å of gold) on top of the silicon wafer.
The product is highly crystalline, with <111> orientation gold and <100> orientation silicon wafer is used. Titanium is used as an adhesion layer to bind gold to the silicon wafer.[1]
Application
Gold coated silicon wafers may be used in soft lithography for micro and nanoscale patterning.
Packaging
Packaging 1 set in single wafer shipper
Storage Class Code
11 - Combustible Solids
WGK
WGK 3
Flash Point(F)
Not applicable
Flash Point(C)
Not applicable
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Customers Also Viewed
Aguilar, M. et al.
Surface Science, 482-485, 935-935 (2001)
Articles
Hybrid organic-inorganic sol-gel materials containing silica were first called “ORMOSILs” in 1984.
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Is the product considered a single crystal or is it polycrystalline and does this product contain an SiO2 layer between the silica layer and the Ti layer?
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