IRMM525A
Niobium
IRMM®, certified reference material, 0.02 mm foil
Synonym(s):
Columbium
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About This Item
Recommended Products
grade
certified reference material
Agency
IRMM®
manufacturer/tradename
JRC
resistivity
13-16 μΩ-cm, 20°C
bp
4742 °C (lit.)
mp
2468 °C (lit.)
density
8.57 g/mL at 25 °C (lit.)
format
matrix material
SMILES string
[Nb]
InChI
1S/Nb
InChI key
GUCVJGMIXFAOAE-UHFFFAOYSA-N
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Analysis Note
For more information please see:
IRMM525A
IRMM525A
Legal Information
IRMM is a registered trademark of European Commission
Storage Class Code
13 - Non Combustible Solids
WGK
nwg
Flash Point(F)
Not applicable
Flash Point(C)
Not applicable
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Optics express, 20(25), 27562-27568 (2012-12-25)
We demonstrate error-free 80km transmission by a silicon carrier-depletion Mach-Zehnder modulator at 10Gbps and the power penalty is as low as 1.15dB. The devices were evaluated through the bit-error-rate characterizations under the system-level analysis. The silicon Mach-Zehnder modulator was also
Journal of the American Chemical Society, 135(5), 1719-1722 (2013-01-23)
2H-NbSe(2) is a canonical Charge-Density-Wave (CDW) layered material the structural details of which remained elusive. We report the detailed structure of 2H-NbSe(2) below the CDW transition using a (3 + 2)-dimensional crystallographic approach on single crystal X-ray diffraction data collected
Physical chemistry chemical physics : PCCP, 15(14), 5115-5131 (2013-03-02)
Ab initio DFT calculations of (93)Nb NMR parameters using the NMR-CASTEP code were performed for a series of over fifty individual niobates, and a good agreement has been found with experimental NMR parameters. New experimental and calculated (93)Nb NMR data
Optics express, 20(25), 27510-27519 (2012-12-25)
Long-distance quantum communication networks require appropriate interfaces between matter qubit-based nodes and low-loss photonic quantum channels. We implement a downconversion quantum interface, where the single photons emitted from a semiconductor quantum dot at 910 nm are downconverted to 1560 nm
Optics express, 20(27), 28119-28124 (2012-12-25)
We report ultra-smooth LiNbO(3) microdisk resonators fabricated by selective ion implantation, chemical etching, and thermal treatment. The undercut microdisk structure is produced by chemically etching the buried lattice damage layer formed by selective ion implantation. By thermal treatment, surface tension
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