669016
Tetrakis(dimethylamido)zirconium(IV)
packaged for use in deposition systems
Synonym(s):
TDMAZ, Tetrakis(dimethylamino)zirconium(IV)
About This Item
Recommended Products
Quality Level
Assay
≥99.99% (trace metals analysis)
form
solid
reaction suitability
core: zirconium
mp
57-60 °C (lit.)
SMILES string
CN(C)[Zr](N(C)C)(N(C)C)N(C)C
InChI
1S/4C2H6N.Zr/c4*1-3-2;/h4*1-2H3;/q4*-1;+4
InChI key
DWCMDRNGBIZOQL-UHFFFAOYSA-N
Looking for similar products? Visit Product Comparison Guide
General description
Application
Signal Word
Danger
Hazard Statements
Precautionary Statements
Hazard Classifications
Eye Irrit. 2 - Flam. Sol. 1 - Skin Irrit. 2 - STOT SE 3 - Water-react 2
Target Organs
Respiratory system
Supplementary Hazards
Storage Class Code
4.3 - Hazardous materials which set free flammable gases upon contact with water
WGK
WGK 3
Flash Point(F)
No data available
Flash Point(C)
No data available
Personal Protective Equipment
Choose from one of the most recent versions:
Already Own This Product?
Find documentation for the products that you have recently purchased in the Document Library.
Customers Also Viewed
Articles
Atomic Layer Deposition (ALD) technology ensures uniform coating on complex 3D surfaces with precise chemisorption cycles.
Atomic Layer Deposition (ALD) technology ensures uniform coating on complex 3D surfaces with precise chemisorption cycles.
Atomic Layer Deposition (ALD) technology ensures uniform coating on complex 3D surfaces with precise chemisorption cycles.
Atomic Layer Deposition (ALD) technology ensures uniform coating on complex 3D surfaces with precise chemisorption cycles.
Our team of scientists has experience in all areas of research including Life Science, Material Science, Chemical Synthesis, Chromatography, Analytical and many others.
Contact Technical Service