Skip to Content
Merck
  • A facile two-step dipping process based on two silica systems for a superhydrophobic surface.

A facile two-step dipping process based on two silica systems for a superhydrophobic surface.

Chemical communications (Cambridge, England) (2011-08-30)
Xiaoguang Li, Jun Shen
PMID21874180
ABSTRACT

A silica microsphere suspension and a silica sol are employed in a two-step dipping process for the preparation of a superhydrophobic surface. It's not only a facile way to achieve the lotus effect, but can also create a multi-functional surface with different wetabilities, adhesive forces and transparencies.

MATERIALS
Product Number
Brand
Product Description
702722
Sigma-Aldrich
Potassium bis(trimethylsilyl)amide solution, 1 M in THF
775061
Sigma-Aldrich
Potassium bis(trimethylsilyl)amide solution, 1.0 M in 2-methyltetrahydrofuran
225770
Sigma-Aldrich
Lithium bis(trimethylsilyl)amide solution, 1.0 M in THF
80631
Sigma-Aldrich
Sodium bis(trimethylsilyl)amide solution, 40% in THF
52619
Supelco
Hexamethyldisilazane, for GC derivatization, LiChropur™, ≥99.0% (GC)
86944
Sigma-Aldrich
Hexamethyldisilazane, produced by Wacker Chemie AG, Burghausen, Germany, ≥97.0% (GC)
324671
Sigma-Aldrich
Potassium bis(trimethylsilyl)amide, 95%
440191
Sigma-Aldrich
Hexamethyldisilazane, reagent grade, ≥99%
277304
Sigma-Aldrich
Potassium bis(trimethylsilyl)amide solution, 0.5 M in toluene
368059
Sigma-Aldrich
Sodium bis(trimethylsilyl)amide solution, 0.6 M in toluene
235083
Sigma-Aldrich
Sodium bis(trimethylsilyl)amide, 95%
245585
Sigma-Aldrich
Sodium bis(trimethylsilyl)amide solution, 1.0 M in THF
775053
Sigma-Aldrich
Lithium bis(trimethylsilyl)amide solution, 0.5 M in 2-methyltetrahydrofuran
379212
Sigma-Aldrich
Hexamethyldisilazane, ReagentPlus®, 99.9%