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P2182

Millipore

Potato Dextrose Agar

Recommended for the isolation of yeasts and molds, NutriSelect® Basic

Synonym(s):

PDA

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About This Item

UNSPSC Code:
41171605
NACRES:
NA.85

biological source

potato

Quality Level

sterility

non-sterile

form

powder

manufacturer/tradename

NutriSelect® Basic

pH

-5.6-25 °C

application(s)

bioburden testing
cosmetics
food and beverages
microbiology
pharmaceutical
sterility testing

storage temp.

10-30°C

suitability

bacteria
molds
yeasts

General description

Potato Dextrose Agar is used for the cultivation of bacteria, fungi, yeast, and molds. The low pH makes the media selective for acid tolerant bacteria, fungi, mold, and yeasts. It is used for studying ascospore dispersal. Potato extract serves as a source of carbon, nitrogen, minerals, vitamins, and other essential growth nutrients. Dextrose acts as source of carbohydrate.

Application

PDA is recommended for use in: -
  • The isolation and enumeration of yeasts and molds from food and dairy products
  • Stimulating sporulation
  • Maintaining stock cultures of fungi
  • Differentiating various dermatophytes based on pigment production

Components

Potato extract - 4 g/L
Dextrose - 20 g/L
Agar - 15 g/L

Other Notes

Contains: Infusions from potatoes, glucose and agar.

Preparation Note

Solve 39 g in 1 litre distilled water. Autoclave 15 minutes at 121°C.

Analysis Note

Microbiologically tested.

Footnote

We offer two media types: the superior granulated GranuCult® and the cost-efficient powdered NutriSelect® culture media, depending on your needs.
The designations basic, plus, or prime are added to indicate the quality control level, from basic quality control to standard QC plus to prime for full regulatory compliance.

Legal Information

GRANUCULT is a registered trademark of Merck KGaA, Darmstadt, Germany
NutriSelect is a registered trademark of Merck KGaA, Darmstadt, Germany

Storage Class Code

11 - Combustible Solids

WGK

WGK 3

Flash Point(F)

Not applicable

Flash Point(C)

Not applicable

Personal Protective Equipment

dust mask type N95 (US), Eyeshields, Gloves

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