Skip to Content
Merck
All Photos(1)

Documents

651842

Sigma-Aldrich

Gold etchant, nickel compatible

Sign Into View Organizational & Contract Pricing
All Photos(1)

About This Item

MDL number:
MFCD07370792
UNSPSC Code:
12352300
NACRES:
NA.23

vapor density

9 (vs air)

Quality Level

100

vapor pressure

0.3 mmHg ( 15 °C)

composition

volatiles, 50-80%

bp

100 °C/1 atm

solubility

H2O: miscible at 20 °C

General description

Nickel compatible gold etchant is an etching solution that can be used in the removal of the gold layer from the surface. Compatibility of gold etchants with nickel allows it to be utilized in applications where nickel is used as a dominant material in the fabrication of micro-electro-mechanical systems (MEMS).

Application

Elective general-purpose etchant for gold. Compatible with negative and positive photoresists.

Features and Benefits

Etching readily controlled with minimum undercutting. Room temperature operated. Cyanide-free, no attack of nickel films.

Pictograms

Health hazard
GHS08

Signal Word

Danger

Hazard Statements

H372

Precautionary Statements

P260 - P264 - P270 - P314 - P501

Hazard Classifications

STOT RE 1 Oral

Target Organs

Thyroid

Storage Class Code

6.1D - Non-combustible acute toxic Cat.3 / toxic hazardous materials or hazardous materials causing chronic effects

WGK

WGK 3

Flash Point(F)

Not applicable

Flash Point(C)

Not applicable

Personal Protective Equipment

dust mask type N95 (US), Eyeshields, Gloves

Certificates of Analysis (COA)

Search for Certificates of Analysis (COA) by entering the products Lot/Batch Number. Lot and Batch Numbers can be found on a product’s label following the words ‘Lot’ or ‘Batch’.

Already Own This Product?

Find documentation for the products that you have recently purchased in the Document Library.

Visit the Document Library

Customers Also Viewed

Slide 1 of 1

1 of 1

Potassium iodide BioUltra, ≥99.5% (AT)

Sigma-Aldrich

60399

Potassium iodide

Micro-elastometry on whole blood clots using actuated surface-attached posts (ASAPs)
Judith RM, et al.
Lab on a chip, 15(5), 1385-1393 (2015)
A monolithic micro-optical interferometer deep etched into fused silica
Weigel C, et al.
Microelectronic Engineering, 174(5), 40-45 (2017)
Determination of young's modulus of electrochemically co-deposited Ni-Al2O3 nanocomposite
Wei X, et al.
Materials Letters, 62(12-13), 1916-1918 (2008)

Protocols

Negative Photoresist Procedure

Photoresist kit offers pre-weighed chemical components for lithographic processes, with separate etchants for various substrate choices.

Negative Photoresist Procedure

Photoresist kit offers pre-weighed chemical components for lithographic processes, with separate etchants for various substrate choices.

Negative Photoresist Procedure

Photoresist kit offers pre-weighed chemical components for lithographic processes, with separate etchants for various substrate choices.

Negative Photoresist Procedure

Photoresist kit offers pre-weighed chemical components for lithographic processes, with separate etchants for various substrate choices.

Our team of scientists has experience in all areas of research including Life Science, Material Science, Chemical Synthesis, Chromatography, Analytical and many others.

Contact Technical Service