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Merck
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文件

401781

Sigma-Aldrich

双（五甲基环戊二烯基）钴 (II)

别名:

CoCp*2, 双(五甲基环戊烯)钴

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About This Item

经验公式（希尔记法）:
C20H30Co
CAS号:
74507-62-3
分子量:
329.39
MDL號碼:
MFCD02093610
分類程式碼代碼:
12352103
PubChem物質ID:
24864881
NACRES:
NA.23

形狀

solid

反應適用性

core: cobalt

mp

>210 °C (lit.)

儲存溫度

2-8°C

SMILES 字串

[Co].C[C]1[C](C)[C](C)[C](C)[C]1C.C[C]2[C](C)[C](C)[C](C)[C]2C

InChI

1S/2C10H15.Co/c2*1-6-7(2)9(4)10(5)8(6)3;/h2*1-5H3;

InChI 密鑰

XDHJNPINFJSJJB-UHFFFAOYSA-N

相关类别

一般說明

双（五甲基环戊二烯）钴（II）是一种功能强大的电子供体，由于其低固态电离能（3.3 eV）被广泛用作制备分子半导体的掺杂剂。该掺杂剂改善电子设备中电荷的注入和迁移。

應用

双（五甲基环戊二烯）钴（II）可用作：
  • 作为n型掺杂剂 用于制造有机电子材料，如酞菁铜薄膜。
  • 作为还原剂用于在室温下合成优质的还原氧化石墨烯。
  • 用于钴的等离子体增强原子层沉积的金属有机物前体。

儲存類別代碼

11 - Combustible Solids

水污染物質分類（WGK）

WGK 3

閃點（°F）

Not applicable

閃點（°C）

Not applicable

個人防護裝備

Eyeshields, Gloves, type N95 (US)

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Decamethylcobaltocene as an efficient n-dopant in organic electronic materials and devices
Calvin K. Chan, et al.
Organic Electronics, 9, 575-581 (2008)
Plasma-enhanced atomic layer deposition of Co using Co(MeCp)2 precursor
Jusang Park, et al.
Journal of Energy Chemistry, 22, 403-407 (2013)
Reduction of Graphene Oxide Thin Films by Cobaltocene and Decamethylcobaltocene
Molly M. MacInnes, et al.
ACS Applied Materials & Interfaces, 10, 2004-2015 (2018)
Carolyn N Valdez et al.
Journal of the American Chemical Society, 140(28), 8924-8933 (2018-06-20)
The effects of a variety of monatomic cations (H+, Li+, Na+, K+, Mg2+, and Ca2+) and larger cations (decamethylcobaltocenium and tetrabutylammonium) on the reduction of colloidal ZnO nanocrystals (NCs) are described. Suspensions of "TOPO"-capped ZnO NCs in toluene/THF were treated

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