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225711

Sigma-Aldrich

Nitric acid

70%, purified by redistillation, ≥99.999% trace metals basis

Synonym(s):

Aqua fortis, Azotic acid, Hydrogen nitrate

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About This Item

Empirical Formula (Hill Notation):
HNO3
CAS Number:
Molecular Weight:
63.01
MDL number:
UNSPSC Code:
12352301
eCl@ss:
38060304
PubChem Substance ID:
NACRES:
NA.22

vapor density

1 (vs air)

vapor pressure

8 mmHg ( 20 °C)

Assay

≥99.999% trace metals basis
70%

form

liquid

purified by

redistillation

color

colorless

pH

<1.0

bp

120.5 °C (lit.)

density

1.413 g/mL at 20 °C (lit.)

SMILES string

O[N+]([O-])=O

InChI

1S/HNO3/c2-1(3)4/h(H,2,3,4)

InChI key

GRYLNZFGIOXLOG-UHFFFAOYSA-N

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General description

Nitric acid is generally used as a primary reagent for the nitration of organic molecules. It is also used as a strong oxidizing agent in organic synthesis to perform the oxidative transformations.

Application

Nitric acid used as a reagent in:
  • The nitration of aromatic compounds, aromatic heterocycles, alkenes, active methylene carbons, etc.
  • Selective oxidation of organosulfur compounds to corresponding sulfoxides using a solid acid catalyst.
  • The oxidation of alcohols, aldehydes, esters, and heteroatoms.
  • The aromatization and dehydrogenation reactions.

Signal Word

Danger

Hazard Statements

Hazard Classifications

Acute Tox. 3 Inhalation - Eye Dam. 1 - Met. Corr. 1 - Ox. Liq. 3 - Skin Corr. 1A

Supplementary Hazards

Storage Class Code

5.1B - Oxidizing hazardous materials

WGK

WGK 1

Flash Point(F)

Not applicable

Flash Point(C)

Not applicable


Certificates of Analysis (COA)

Search for Certificates of Analysis (COA) by entering the products Lot/Batch Number. Lot and Batch Numbers can be found on a product’s label following the words ‘Lot’ or ‘Batch’.

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Chemoselective sulfoxidation by H2O2 or HNO3 using a phosphate impregnated titania catalyst
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Nitric Acid
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Encyclopedia of Reagents for Organic Synthesis, Second Edition (2001)
Nitric acid in the presence of P2O5 supported on silica gel?a useful reagent for nitration of aromatic compounds under solvent-free conditions
Hajipour AR and Ruoho AE
Tetrahedron Letters, 46(48), 8307-8310 (2005)

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