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Third-harmonic UV generation in silicon nitride nanostructures.

Optics express (2013-02-08)
Tingyin Ning, Outi Hyvärinen, Henna Pietarinen, Tommi Kaplas, Martti Kauranen, Göery Genty
RESUMEN

We report on strong UV third-harmonic generation from silicon nitride films and resonant waveguide gratings. We determine the absolute value of third-order susceptibility of silicon nitride at wavelength of 1064 nm to be χ(³) (-3ω,ω,ω,ω) = (2.8 ± 0.6) × 10⁻²⁰m²/V², which is two orders of magnitude larger than that of fused silica. The third-harmonic generation is further enhanced by a factor of 2000 by fabricating a resonant waveguide grating onto a silicon nitride film. Our results extend the operating range of CMOS-compatible nonlinear materials to the UV spectral regime.

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Sigma-Aldrich
Silicon nitride, powder, ≥99.9% trace metals basis
Sigma-Aldrich
Silicon nitride, predominantly β-phase, ≤10micron primary particle size
Sigma-Aldrich
Silicon nitride, nanopowder, <50 nm particle size (spherical), ≥98.5% trace metals basis
Sigma-Aldrich
Silicon nitride, predominantly α-phase, ≤10 micron