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Merck

C87851

Sigma-Aldrich

Copper(II) acetylacetonate

97%

Sinónimos:

2,4-Pentanedione copper(II) derivative, Bis(2,4-pentanedionato)copper(II), Cu(acac)2, Cupric acetylacetonate

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About This Item

Fórmula lineal:
Cu(C5H7O2)2
Número de CAS:
Peso molecular:
261.76
Beilstein/REAXYS Number:
4157957
EC Number:
MDL number:
UNSPSC Code:
12352103
PubChem Substance ID:
NACRES:
NA.23

assay

97%

form

powder

reaction suitability

core: copper
reagent type: catalyst

mp

284-288 °C (dec.) (lit.)

SMILES string

CC(=O)\C=C(\C)O[Cu]O\C(C)=C/C(C)=O

InChI

1S/2C5H8O2.Cu/c2*1-4(6)3-5(2)7;/h2*3,6H,1-2H3;/q;;+2/p-2/b2*4-3-;

InChI key

QYJPSWYYEKYVEJ-FDGPNNRMSA-L

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Application


  • Dextromethorphan as a moderator of reward deficiency: Research explored Dextromethorphan′s role in moderating reward deficiency associated with serotonin transporter availability in MDMA-treated animals, indicating its potential application in neuropsychopharmacology and addiction studies (Chiu et al., 2024).

  • Pharmacotherapies targeting GABA-Glutamate neurotransmission: A review discussed the use of Dextromethorphan among pharmacotherapies targeting GABA-glutamate neurotransmission for treatment-resistant depression, highlighting its role as an NMDA receptor antagonist and sigma-1 receptor agonist (Vecera et al., 2023).

  • Experience-dependent psychological effects: A double-blind study compared the psychological effects of Dextromethorphan and Psilocybin in healthy volunteers, examining their experience-dependent and enduring impacts, relevant in clinical psychology and psychedelic research (Mathai et al., 2023).

pictograms

Exclamation mark

signalword

Warning

Hazard Classifications

Eye Irrit. 2 - Skin Irrit. 2 - STOT SE 3

target_organs

Respiratory system

Storage Class

11 - Combustible Solids

wgk_germany

WGK 3

flash_point_f

Not applicable

flash_point_c

Not applicable

ppe

dust mask type N95 (US), Eyeshields, Gloves


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Zhan'ao Tan et al.
Physical chemistry chemical physics : PCCP, 14(42), 14589-14595 (2012-09-28)
A solution-processed vanadium oxide (s-VO(x)) anode buffer layer on an indium-tin-oxide (ITO) electrode was used instead of PEDOT:PSS for improving the stability and photovoltaic performance of the polymer solar cells (PSCs). The s-VO(x) layer was prepared by spin-coating a vanadyl
Gong-Jun Chen et al.
Dalton transactions (Cambridge, England : 2003), 39(44), 10637-10643 (2010-10-06)
Two Eu(III) complexes, [Eu(acac)(3)(dpq)] (1) and [Eu(acac)(3)(dppz)] CH(3)OH (2) {viz. acetylacetonate (acac), dipyrido[3,2-d:20,30-f]quinoxaline (dpq), dipyrido[3,2-a:20,30-c] phenazine (dppz)}, have been synthesized and their DNA binding, photo-induced DNA cleavage activity and cell cytotoxicity are studied. The complexes display significant binding propensity to
Zofia Kowalewska et al.
Talanta, 103, 66-74 (2012-12-04)
The aim of this work was to investigate the influence of magnesium acetylacetonate (MgA) on the signal of organic forms of vanadium in xylene solution by graphite furnace atomic absorption spectrometry. MgA alone or mixed with palladium acetylacetonate (PdA) was
Nan Tian et al.
Dalton transactions (Cambridge, England : 2003), 39(37), 8613-8615 (2010-08-19)
The design, synthesis, photophysical and significantly improved electrooptical properties of a series of red emitting cyclometalated iridium(iii) complexes containing carbazolyl-acetylacetonate ligands are described.
S S Arandjelovic et al.
Journal of B.U.ON. : official journal of the Balkan Union of Oncology, 14(2), 271-279 (2009-08-04)
To investigate the antitumor activity of two newly synthesized ruthenium(III) [Ru(III)] compounds carrying bidentate ligands: (acac)-acetylacetonate, [Ru(acac)3), and (tfac)-trifluoroacetylacetonate [Ru(tfac)3]. The activity of ruthenium(III) analogues was evaluated on HeLa, B16, and Femx cell lines for cytotoxicity in vitro using MTT

Artículos

Copper metal deposition processes are an essential tool for depositing interconnects used in microelectronic applications, giving group 11 (coinage metals: Copper, Silver, and Gold) an important place in atomic layer deposition (ALD) process development.

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