콘텐츠로 건너뛰기
Merck
  • Effects of UV/H(2)O(2) advanced oxidation on chemical characteristics and chlorine reactivity of surface water natural organic matter.

Effects of UV/H(2)O(2) advanced oxidation on chemical characteristics and chlorine reactivity of surface water natural organic matter.

Water research (2010-06-18)
Siva Sarathy, Madjid Mohseni
초록

The advanced oxidation process utilizing ultraviolet and hydrogen peroxide (UV/H(2)O(2)) is currently applied in commercial drinking water applications for the removal of various organic pollutants. Natural organic matter (NOM) present in the source water can also be oxidized and undergo changes at the fluence and H(2)O(2) concentrations applied in commercial drinking water UV/H(2)O(2) applications (fluences less than 2000 mJ cm(-2), initial H(2)O(2) concentrations less than 15 mg L(-1)). In this study, the impact of UV/H(2)O(2) on NOM's aromaticity, hydrophobicity, and potential to form trihalomethanes (THMs) and haloacetic acids (HAAs) was investigated for raw surface water and the same water with the very hydrophobic acid (VHA) fraction of NOM removed. During UV/H(2)O(2) treatments, NOM in the raw surface water was partially oxidized to less aromatic and hydrophobic characteristics, but was not mineralized, confirming findings from past research. Below fluences of 1500 mJ cm(-2) UV/H(2)O(2) treatment of the raw water did not lead to reduction in the formation potential of THMs. The formation potential of HAAs was reduced at a fluence of 500 mJ cm(-2) with only small additional reductions as fluence further increased. For the water from which the VHA fraction was removed, UV/H(2)O(2) treatment led to mineralization of NOM suggesting that, when coupled with a pre-treatment capable of removing the VHA fraction, UV/H(2)O(2) could achieve further reductions in NOM. These subsequent reductions in NOM led to continuous reductions in the formation potentials of THMs and HAAs as fluence increased.

MATERIALS
제품 번호
브랜드
제품 설명

Supelco
Amberlite XAD4, 20-60 mesh
Supelco
Amberlite XAD4, 20-60 mesh