Precursor to boron carbide thin films by chemical vapor deposition (CVD).[1]
Trimethylboron is used as an organometallic precursor for the CVD of boron-carbon containing films and as a boron source in the deposition of borophosphosilicate glass (BPSG).
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Currently, there are no methods available offering solutions to select and identify antibodies binding to a specific conformational epitope of an antigen. Here, we developed a method to allow epitope-directed antibody selection from a phage display library by photocrosslinking bound
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