Skip to Content
Merck
  • Precursor chemistry matters in boosting photoredox activity of graphene/semiconductor composites.

Precursor chemistry matters in boosting photoredox activity of graphene/semiconductor composites.

Nanoscale (2015-09-26)
Min-Quan Yang, Chuang Han, Nan Zhang, Yi-Jun Xu
ABSTRACT

Considerable effort has been made to fabricate graphene (GR)/semiconductor composite photocatalysts, by using graphene oxide (GO) as the most widely used precursor of GR, toward an improved efficacy of solar energy conversion. However, thus far, the role of GO in the preparation and photocatalytic activity of GR/semiconductor composites has remained rather elusive. Herein, we report a simple yet efficient approach to significantly improve the photocatalytic activity of GR/semiconductor CdS composites via the acid treatment of GO, which downsizes GO sheets into smaller ones with enhanced colloidal stability and oxygenated functional groups. The graphene/CdS composites, which are prepared using this type of downsized GO as the precursor of GR, exhibit remarkably higher visible-light photoredox activity than those prepared from the direct reduction of GO without acid treatment. Our comparative results directly highlight the important effect of physico-chemical features of GO on the preparation and thus photoactivity of GR/semiconductor composites; in particular, the rational tailoring of GO could open a new doorway to optimize the activity of GO-derived GR/semiconductor composite photocatalysts.

MATERIALS
Product Number
Brand
Product Description

Sigma-Aldrich
Hydrogen peroxide solution, contains inhibitor, 30 wt. % in H2O, meets USP testing specifications
Sigma-Aldrich
N,N-Dimethylformamide, biotech. grade, ≥99.9%
Sigma-Aldrich
Potassium permanganate, ACS reagent, ≥99.0%, low in mercury
Sigma-Aldrich
Hydrogen peroxide solution, contains inhibitor, 30 wt. % in H2O, ACS reagent
Sigma-Aldrich
Hydrogen peroxide solution, 50 wt. % in H2O, stabilized
Sigma-Aldrich
N,N-Dimethylformamide, ReagentPlus®, ≥99%
Sigma-Aldrich
N,N-Dimethylformamide, ACS reagent, ≥99.8%
Sigma-Aldrich
Potassium permanganate, ≤150 μm particle size, 97%
Cadmium(II) acetate, SAFC Hitech®, anhydrous, 99.995%
Sigma-Aldrich
Cadmium(II) acetate, anhydrous, 99.995%
Sigma-Aldrich
Hydrogen peroxide solution, 34.5-36.5%
Sigma-Aldrich
Aluminum oxide, mesoporous, MSU-X (wormhole), average pore size 3.8 nm
Sigma-Aldrich
4-Nitrophenol solution, 10 mM
Sigma-Aldrich
4-Nitrophenol, ReagentPlus®, ≥99%
Sigma-Aldrich
N,N-Dimethylformamide, for molecular biology, ≥99%
Sigma-Aldrich
Hydrogen peroxide solution, 30 % (w/w) in H2O, contains stabilizer
Sigma-Aldrich
Nitric-14N acid solution, ~10 N in H2O, 99.99 atom % 14N
Sigma-Aldrich
Nitric acid, ACS reagent, ≥90.0%
Sigma-Aldrich
Aluminum oxide, nanoparticles, <50 nm particle size (DLS), 20 wt. % in isopropanol
Sigma-Aldrich
Aluminum oxide, single crystal substrate, <0001>
Sigma-Aldrich
Benzyl alcohol, anhydrous, 99.8%
Sigma-Aldrich
Dimethyl sulfoxide, BioUltra, for molecular biology, ≥99.5% (GC)
Sigma-Aldrich
4-Nitroanisole, 97%
Sigma-Aldrich
α,α,α-Trifluorotoluene solution, NMR reference standard, 0.05% in benzene-d6 (99.6 atom % D)
Sigma-Aldrich
Benzyl alcohol, ≥99%, FCC, FG
Sigma-Aldrich
1-Chloro-4-nitrobenzene, 99%
Sigma-Aldrich
4-Nitrotoluene, 99%
Sigma-Aldrich
2-Nitroaniline, 98%
Sigma-Aldrich
Benzyl alcohol, natural, ≥98%, FG
Sigma-Aldrich
Aluminum oxide, nanopowder, <50 nm particle size (TEM)