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651796

Sigma-Aldrich

Negative photoresist I

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About This Item

Número de CAS:
9003-31-0
MDL number:
MFCD00084438
UNSPSC Code:
41116107
NACRES:
NA.23

mol wt

average Mw 60,000-70,000 (polyisoprene)

composition

solids, 27-29 wt. %

dielectric constant

2.4

surface tension

29.2 dyn/cm

viscosity

465-535 cP(25 °C)

bp

122-142 °C (lit.)

density

0.89 g/mL at 25 °C (lit.)

λmax

310-480 nm

storage temp.

2-8°C

InChI

1S/C14H28O2/c1-4-5-6-7-8-9-10-13-15-11-14(2,3)12-16-13/h13H,4-12H2,1-3H3

InChI key

UBZVSDZJBLSIJG-UHFFFAOYSA-N

Categorías relacionadas

General description

A stabilized, purified photoresist which exhibits superior resolution, adhesion, etch resistance and low pinhole density.
Available as part of Negative Photoresist kit 654892

signalword

Danger

Hazard Classifications

Acute Tox. 4 Dermal - Acute Tox. 4 Inhalation - Aquatic Chronic 3 - Asp. Tox. 1 - Eye Irrit. 2 - Flam. Liq. 3 - Repr. 1B - Skin Irrit. 2 - STOT SE 3

target_organs

Respiratory system

Storage Class

3 - Flammable liquids

wgk_germany

WGK 3

flash_point_f

75.2 °F - closed cup

flash_point_c

24 °C - closed cup

ppe

Eyeshields, Faceshields, Gloves, type ABEK (EN14387) respirator filter

Certificados de análisis (COA)

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Gérald Guérin et al.
Journal of the American Chemical Society, 130(44), 14763-14771 (2008-10-14)
In alkane solvents, poly(isoprene-b-ferrocenyldimethylsilane) (PI-b-PFS) block copolymer forms fiberlike micelles, which show intriguing similarities with biological fibers such as amyloid fibers. Both systems exhibit fiber growth by a nucleated self-assembly mechanism and rapidly fragment upon exposure to the shear forces
Thomas Schmidt et al.
BMC biochemistry, 11, 11-11 (2010-02-23)
Natural rubber is a biopolymer with exceptional qualities that cannot be completely replaced using synthetic alternatives. Although several key enzymes in the rubber biosynthetic pathway have been isolated, mainly from plants such as Hevea brasiliensis, Ficus spec. and the desert
Shunsuke Imai et al.
Enzyme and microbial technology, 49(6-7), 526-531 (2011-12-07)
Rubber-degrading bacteria were screened for the production of clearing zones around their colonies on latex overlay agar plates. Novel three bacteria, Streptomyces sp. strain LCIC4, Actinoplanes sp. strain OR16, and Methylibium sp. strain NS21, were isolated. To the best of
S Wołoszczuk et al.
The European physical journal. E, Soft matter, 33(4), 343-350 (2010-12-02)
We simulate ABA triblock copolymer melts using a lattice Monte Carlo method, known as cooperative motion algorithm, probing various degrees of compositional asymmetry. Selected order-disorder transition lines are determined in terms of the segment incompatibility, quantified by product χN
Stéphane Dubascoux et al.
Journal of chromatography. A, 1224, 27-34 (2012-01-17)
This paper presents results from the first analyses of the mesostructure of natural rubber (NR) by asymmetrical flow field flow fractionation (AF4). The results are compared with those obtained by size exclusion chromatography (SEC) in terms of average molar masses
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Protocolos

Negative Photoresist Procedure

Photoresist kit offers pre-weighed chemical components for lithographic processes, with separate etchants for various substrate choices.

Negative Photoresist Procedure

Photoresist kit offers pre-weighed chemical components for lithographic processes, with separate etchants for various substrate choices.

Negative Photoresist Procedure

Photoresist kit offers pre-weighed chemical components for lithographic processes, with separate etchants for various substrate choices.

Negative Photoresist Procedure

Photoresist kit offers pre-weighed chemical components for lithographic processes, with separate etchants for various substrate choices.

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