900755

SLAP TA

95%

• Synonyme(s) : 3-(((Trimethylsilyl)methyl)thio)propan-1-amine
• Formule empirique (notation de Hill): C₇H₁₉NSSi
• Numéro CAS: 2093935-86-3
• Poids moléculaire : 177.38
• Code UNSPSC : 12352103
• Nomenclature NACRES : NA.22

Propriétés

• Niveau de qualité: 100
• Pureté: 95%
• Forme: liquid
• Densité: 0.90452
• Température de stockage: 2-8°C

Description

Application

When used with aliphatic or aromatic aldehydes, this silicon amine protocol SLAP reagent enables the photomediated synthesis of thiomorpholines and thiazepanes. For photocatalytic cross-coupling with this SLAP Reagent, Ir[(ppy)₂dtbbpy]PF₆ (747769) is used with a recommended starting combination of Lewis acids Bi(OTf)₃ (633305) and Cu(OTf)₂ (283673) prior to subsequent substrate-specific optimization. This product was introduced in collaboration with the Bode Research Group and provides a tin-free alternative to SnAP (tin amine protocol) reagents and is well-suited for scale-up reactions.

Autres remarques

• Technology Spotlight: SLAP Reagents for Piperazine Synthesis
• Silicon Amine Reagents for the Photocatalytic Synthesis of Piperazines from Aldehydes and Ketones
• Lewis Acid Induced Toggle from Ir(II) to Ir(IV) Pathways in Photocatalytic Reactions: Synthesis of Thiomorpholines and Thiazepanes from Aldehydes and SLAP Reagents.
• Continuous Flow Synthesis of Morpholines and Oxazepanes with Silicon Amine Protocol (SLAP) Reagents and Lewis Acid Facilitated Photoredox Catalysis

Informations sur la sécurité

• Pictogrammes: GHS02
• Mention d'avertissement: Warning
• Mentions de danger: H226
• Conseils de prudence: P210 - P370 + P378
• Classification des risques: Flam. Liq. 3
• Code de la classe de stockage: 3 - Flammable liquids
• Classe de danger pour l'eau (WGK): WGK 3
• Point d'éclair (°F): 75.0 °F
• Point d'éclair (°C): 23.89 °C