900755

SLAP TA

95%

• Sinónimos: 3-(((Trimethylsilyl)methyl)thio)propan-1-amine
• Fórmula empírica (notación de Hill): C₇H₁₉NSSi
• Número de CAS: 2093935-86-3
• Peso molecular: 177.38
• Código UNSPSC: 12352103
• NACRES: NA.22

Propiedades

• Nivel de calidad: 100
• Análisis: 95%
• formulario: liquid
• densidad: 0.90452
• temp. de almacenamiento: 2-8°C

Descripción

Aplicación

When used with aliphatic or aromatic aldehydes, this silicon amine protocol SLAP reagent enables the photomediated synthesis of thiomorpholines and thiazepanes. For photocatalytic cross-coupling with this SLAP Reagent, Ir[(ppy)₂dtbbpy]PF₆ (747769) is used with a recommended starting combination of Lewis acids Bi(OTf)₃ (633305) and Cu(OTf)₂ (283673) prior to subsequent substrate-specific optimization. This product was introduced in collaboration with the Bode Research Group and provides a tin-free alternative to SnAP (tin amine protocol) reagents and is well-suited for scale-up reactions.

Otras notas

• Technology Spotlight: SLAP Reagents for Piperazine Synthesis
• Silicon Amine Reagents for the Photocatalytic Synthesis of Piperazines from Aldehydes and Ketones
• Lewis Acid Induced Toggle from Ir(II) to Ir(IV) Pathways in Photocatalytic Reactions: Synthesis of Thiomorpholines and Thiazepanes from Aldehydes and SLAP Reagents.
• Continuous Flow Synthesis of Morpholines and Oxazepanes with Silicon Amine Protocol (SLAP) Reagents and Lewis Acid Facilitated Photoredox Catalysis

Información de seguridad

• Pictogramas: GHS02
• Palabra de señalización: Warning
• Frases de peligro: H226
• Consejos de prudencia: P210 - P370 + P378
• Clasificaciones de peligro: Flam. Liq. 3
• Código de clase de almacenamiento: 3 - Flammable liquids
• Clase de riesgo para el agua (WGK): WGK 3
• Punto de inflamabilidad (°F): 75.0 °F
• Punto de inflamabilidad (°C): 23.89 °C