Nonvolatile Multilevel Photomemory Based on Lead-Free Double Perovskite Cs2AgBiBr6 Nanocrystals Wrapped Within SiO2 as a Charge Trapping Layer.

Floating gate transistor photomemory (FGTPM) has been regarded as one of the most prospective nonvolatile photomemory devices because of its compatibility with transistor-based circuits, nondestructive reading, and multilevel storage. Until now, owing to the excellent photoelectric properties, lead-based perovskite nanocrystals (PNCs) have been applied in most of the perovskite-based FGTPM devices and embedded in the polymer matrix as the charge trapping layer. However, the polymer matrix and its solvent would degrade the structure of the PNCs, resulting in the loss of their unique photoresponse ability. In addition, lead-based perovskites have environmental unfriendliness and poor stability. Hence, a novel nonvolatile FGTPM based on oligomeric silica (OS) wrapped lead-free double perovskite Cs2AgBiBr6 NCs was demonstrated for the first time. Acting synchronously as the protection layer for the discrete Cs2AgBiBr6 NCs and charge tunneling layer for the FGTPM device, the OS layer can achieve controllable thickness by adjusting the process parameters, leading to an adjustment of storage properties with a larger memory window (58 V). Owing to the excellent photoresponse ability of the Cs2AgBiBr6@OS composite layer, the FGTPM device exhibited high-performance with repeatable multilevel nonvolatile photomemory and precise photoresponse ability of wavelength/time/power-dependent photoirradiation without extra gate biasing.