Skip to Content
Merck
  • Regeneration of a conjugated sp² graphene system through selective defunctionalization of epoxides by using a proven synthetic chemistry mechanism.

Regeneration of a conjugated sp² graphene system through selective defunctionalization of epoxides by using a proven synthetic chemistry mechanism.

Chemistry (Weinheim an der Bergstrasse, Germany) (2014-02-04)
Chun Kiang Chua, Martin Pumera
ABSTRACT

Graphene is a promising material capable of driving technological advancement. It is, however, a challenge to obtain pristine graphene in large quantities given the limitation of current synthetic methods. Among the numerous methods available, the chemical approach provides an optimistic outlook and has garnered much interest within the graphene community as a potential alternative. One of the most crucial steps of the chemical approach is the chemical reduction of graphene oxide as this dictates the final quality of the graphene sheets. In recent years, much of the focus has shifted to the usage of established reducing agents or oxygen removal reagents, frequently applied in organic chemistry, onto a graphene oxide platform. Herein, the selective removal of epoxide groups and subsequent regeneration of disrupted conjugated sp(2) system is highlighted, based on the synergistic effect of indium and indium(I) chloride. The morphological, structural, and electrical properties of the resulting graphene were fully characterized with X-ray photoelectron, Fourier transform IR, solid-state (13)C NMR, and Raman spectroscopy; thermogravimetric analysis; scanning electron microscopy; and conductivity measurements. The as-prepared graphene showed a tenfold increase in conductivity against conventional graphene treated with hydrazine reducing agent and demonstrated a high dispersion stability in ethanol. Moreover, the selective defunctionalization of the epoxide groups provides opportunities for potential tailoring of graphene properties for prospective applications.

MATERIALS
Product Number
Brand
Product Description

Sigma-Aldrich
Sodium nitrate, ReagentPlus®, ≥99.0%
Sigma-Aldrich
Hydrogen peroxide solution, contains inhibitor, 30 wt. % in H2O, meets USP testing specifications
Sigma-Aldrich
Sulfuric acid, ACS reagent, 95.0-98.0%
Sigma-Aldrich
Hydrogen peroxide solution, contains inhibitor, 35 wt. % in H2O
Sigma-Aldrich
Hydrogen peroxide solution, contains inhibitor, 30 wt. % in H2O, ACS reagent
Sigma-Aldrich
Hydrogen peroxide solution, 50 wt. % in H2O, stabilized
Sigma-Aldrich
Sodium nitrate, ACS reagent, ≥99.0%
Sigma-Aldrich
Sodium nitrate-14N, 99.95 atom % 14N
Supelco
Hydrogen peroxide solution, 30 % (w/w), for ultratrace analysis
Supelco
Sulfuric acid, for the determination of nitrogen, ≥97.0%
Sigma-Aldrich
Hydrogen peroxide solution, 34.5-36.5%
Supelco
Hydrogen peroxide solution, ≥30%, for trace analysis
Sigma-Aldrich
Hydrogen peroxide solution, tested according to Ph. Eur.
Sigma-Aldrich
Sodium nitrate, 99.995% trace metals basis
Sigma-Aldrich
Sulfuric acid, 99.999%
Millipore
Hydrogen peroxide solution, 3%, suitable for microbiology
Sigma-Aldrich
Sodium nitrate, ≥99.0%, suitable for plant cell culture
Sigma-Aldrich
Hydrogen peroxide solution, 30 % (w/w) in H2O, contains stabilizer
Sigma-Aldrich
Sodium nitrate, BioXtra, ≥99.0%
Supelco
Sodium nitrate, analytical standard
Sigma-Aldrich
Sodium nitrate, BioUltra, ≥99.0% (T)
Sigma-Aldrich
Sulfuric acid, puriss., meets analytical specification of Ph. Eur., BP, 95-97%
Supelco
Sulfuric acid concentrate, 0.1 M H2SO4 in water (0.2N), eluent concentrate for IC