Skip to Content
Merck
All Photos(2)

Key Documents

View All Documentation

663301

Sigma-Aldrich

Trimethylaluminum

packaged for use in deposition systems

Synonym(s):

Aluminum trimethanide, TMA

Sign Into View Organizational & Contract Pricing
All Photos(2)

About This Item

Linear Formula:
(CH3)3Al
CAS Number:
75-24-1
Molecular Weight:
72.09
Beilstein:
3587197
EC Number:
200-853-0
MDL number:
MFCD00008252
UNSPSC Code:
12352103
PubChem Substance ID:
24884629
NACRES:
NA.23

vapor pressure

69.3 mmHg ( 60 °C)

description

heat of vaporization: ~41.9 kJ/mol (Dimer)

form

liquid

reaction suitability

core: aluminum

bp

125-126 °C (lit.)
127 °C/760 mmHg
20 °C/8 mmHg
56 °C/50 mmHg

mp

15 °C (lit.)

density

0.752 g/mL at 25 °C (lit.)

SMILES string

C[Al](C)C

InChI

1S/3CH3.Al/h3*1H3;

InChI key

JLTRXTDYQLMHGR-UHFFFAOYSA-N

Looking for similar products? Visit Product Comparison Guide

General description

Trimethylaluminum ismainly used in the industrial production of polyethylene and other syntheticpolymers, where it is used as a co-catalyst for the polymerization reaction. Itis also used as a precursor to produce inorganic aluminum compounds, includingalumina and various zeolites.

Application

Precursors Packaged for Depositions Systems
Trimethylaluminum can be used as:
  • A chemical vapor deposition precursor to fabricate PbSe quantum dot solids for optoelectronic devices.
  • An aluminum precursor for the flame synthesis of alumina nanofibers.
  • A reagent for efficient synthesis of allenes.

Pictograms

FlameCorrosion
GHS02,GHS05

Signal Word

Danger

Hazard Statements

H250,H260,H314

Hazard Classifications

Eye Dam. 1 - Pyr. Liq. 1 - Skin Corr. 1B - Water-react 1

Supplementary Hazards

EUH014

Storage Class Code

4.2 - Pyrophoric and self-heating hazardous materials

WGK

nwg

Flash Point(F)

No data available

Flash Point(C)

No data available

Personal Protective Equipment

dust mask type N95 (US), Eyeshields, Gloves

Certificates of Analysis (COA)

Search for Certificates of Analysis (COA) by entering the products Lot/Batch Number. Lot and Batch Numbers can be found on a product’s label following the words ‘Lot’ or ‘Batch’.

Already Own This Product?

Find documentation for the products that you have recently purchased in the Document Library.

Visit the Document Library

Highly efficient synthesis of allenes from trimethylaluminum reagent and propargyl acetates mediated by a palladium catalyst
Qing-Han Li, et al.
European Journal of Organic Chemistry, 2014, 7916-7923 (2014)
Formation of alumina nanofibers in carbon-containing coflow laminar diffusion flames
Bing Guo, et al.
Journal of Aerosol Science, 40, 379-384 (2009)
Alexander C Kozen et al.
ACS nano, 9(6), 5884-5892 (2015-05-15)
Lithium metal is considered to be the most promising anode for next-generation batteries due to its high energy density of 3840 mAh g(-1). However, the extreme reactivity of the Li surface can induce parasitic reactions with solvents, contamination, and shuttled
Mahtab Farzin et al.
Pathology, 47(4), 302-307 (2015-05-06)
BRCA1-associated protein 1 (BAP1) is a tumour suppressor gene frequently inactivated in mesothelioma, rarely also in association with germline mutation. BAP1 mutations have been associated with improved prognosis and distinct clinicopathological features. We sought to determine the clinicopathological significance of
J L L Robinson et al.
Oncogene, 33(50), 5666-5674 (2013-12-03)
Castration-resistant prostate cancer (CRPC) continues to pose a significant clinical challenge with new generation second-line hormonal therapies affording limited improvement in disease outcome. As the androgen receptor (AR) remains a critical driver in CRPC, understanding the determinants of its transcriptional
View All Related Papers

Articles

Atomic Layer Deposition (ALD)

Atomic layer deposition (ALD) showcases innovation in novel structure synthesis, area-selective deposition, low-temperature deposition, and more.

Atomic Layer Deposition (ALD)

Atomic layer deposition (ALD) showcases innovation in novel structure synthesis, area-selective deposition, low-temperature deposition, and more.

Atomic Layer Deposition (ALD)

Atomic layer deposition (ALD) showcases innovation in novel structure synthesis, area-selective deposition, low-temperature deposition, and more.

Atomic Layer Deposition (ALD)

Atomic layer deposition (ALD) showcases innovation in novel structure synthesis, area-selective deposition, low-temperature deposition, and more.

See All

Our team of scientists has experience in all areas of research including Life Science, Material Science, Chemical Synthesis, Chromatography, Analytical and many others.

Contact Technical Service