Skip to Content
MilliporeSigma
All Photos(1)

Key Documents

251518

Sigma-Aldrich

Tributyltin ethoxide

97%

Sign Into View Organizational & Contract Pricing


About This Item

Linear Formula:
[CH3(CH2)3]3SnOC2H5
CAS Number:
Molecular Weight:
335.11
MDL number:
UNSPSC Code:
12352103
PubChem Substance ID:

assay

97%

refractive index

n20/D 1.467 (lit.)

bp

92 °C/0.1 mmHg (lit.)

density

1.098 g/mL at 25 °C (lit.)

SMILES string

CCCC[Sn](CCCC)(CCCC)OCC

InChI

1S/3C4H9.C2H5O.Sn/c3*1-3-4-2;1-2-3;/h3*1,3-4H2,2H3;2H2,1H3;/q;;;-1;+1

InChI key

SDTAGBUVRXOKAK-UHFFFAOYSA-N

signalword

Danger

Hazard Classifications

Acute Tox. 3 Oral - Acute Tox. 4 Dermal - Aquatic Acute 1 - Aquatic Chronic 1 - Eye Irrit. 2 - Flam. Liq. 3 - Repr. 1B - Skin Irrit. 2 - STOT RE 1

Storage Class

3 - Flammable liquids

wgk_germany

WGK 3

flash_point_f

104.0 °F - closed cup

flash_point_c

40 °C - closed cup

ppe

Eyeshields, Faceshields, Gloves, type ABEK (EN14387) respirator filter


Choose from one of the most recent versions:

Certificates of Analysis (COA)

Lot/Batch Number

Don't see the Right Version?

If you require a particular version, you can look up a specific certificate by the Lot or Batch number.

Already Own This Product?

Find documentation for the products that you have recently purchased in the Document Library.

Visit the Document Library

Charith E Nanayakkara et al.
Langmuir : the ACS journal of surfaces and colloids, 33(24), 5998-6004 (2017-05-24)
Uniform and conformal deposition of tin oxide thin films is important for several applications in electronics, gas sensing, and transparent conducting electrodes. Thermal atomic layer deposition (ALD) is often best suited for these applications, but its implementation requires a mechanistic

Questions

Reviews

No rating value

Active Filters

Our team of scientists has experience in all areas of research including Life Science, Material Science, Chemical Synthesis, Chromatography, Analytical and many others.

Contact Technical Service