Skip to Content
MilliporeSigma
All Photos(1)

Key Documents

View All Documentation

490407

Sigma-Aldrich

Chloropentamethyldisilane

97%

Synonym(s):

1-Chloro-1,1,2,2,2-pentamethyldisilane, Chlorodimethyl(trimethylsilyl)silane, Chloropentamethyldisilane, Pentamethylchlorodisilane

Sign Into View Organizational & Contract Pricing
All Photos(1)

About This Item

Linear Formula:
(CH3)3SiSi(CH3)2Cl
CAS Number:
1560-28-7
Molecular Weight:
166.80
EC Number:
216-330-5
MDL number:
MFCD00456692
UNSPSC Code:
12352300
PubChem Substance ID:
24872557
NACRES:
NA.23

assay

97%

form

liquid

refractive index

n20/D 1.4415 (lit.)

bp

134-136 °C (lit.)

density

0.862 g/mL at 25 °C (lit.)

SMILES string

C[Si](C)(C)[Si](C)(C)Cl

InChI

1S/C5H15ClSi2/c1-7(2,3)8(4,5)6/h1-5H3

InChI key

GJCAUTWJWBFMFU-UHFFFAOYSA-N

Application

Chloropentamethyldisilane may be used as one of the constituents for the sythesis of silyloxyjulolidine (SiN1) as a source of silyl radicals which may be used as photoinitiators for free radical photopolymerization. It may also be used in the preparation of 2-pentamethyldisilanyloxymethyl)phenylpentamethyldisilane.

pictograms

FlameCorrosion
GHS02,GHS05

signalword

Danger

hcodes

H226,H314

Hazard Classifications

Flam. Liq. 3 - Skin Corr. 1B

supp_hazards

EUH014

Storage Class

3 - Flammable liquids

wgk_germany

WGK 3

flash_point_f

102.2 °F - closed cup

flash_point_c

39 °C - closed cup

ppe

Faceshields, Gloves, Goggles, type ABEK (EN14387) respirator filter

Choose from one of the most recent versions:

Certificates of Analysis (COA)

Lot/Batch Number
SHBN7849
SHBN5076
SHBM9950
SHBH2295V
SHBF9619V

Don't see the Right Version?

If you require a particular version, you can look up a specific certificate by the Lot or Batch number.

Search for a COA

Already Own This Product?

Find documentation for the products that you have recently purchased in the Document Library.

Visit the Document Library

Customers Also Viewed

Slide 1 of 1

1 of 1

(3-Aminopropyl)triethoxysilane ≥98.0%

Sigma-Aldrich

741442

(3-Aminopropyl)triethoxysilane

Silyloxyamines as sources of silyl radicals: ESR spin-trapping, laser flash photolysis investigation, and photopolymerization ability.
Versace DL, et al.
Journal of Physical Organic Chemistry, 24(4), 342-350 (2011)
Photoinduced Rearrangement Reaction of 2-(Pentamethyldisilanyloxymethyl) phenylpentamethyldisilane.
Park SK and Gong SY
Bull. Korean Chem. Soc., 31(3), 731-734 (2010)
Silyloxyamines as sources of silyl radicals: ESR spin-trapping, laser flash photolysis investigation, and photopolymerization ability.
Versace DL, et al.
Journal of Physical Organic Chemistry, 24(4), 342-350 (2011)

Articles

Silicon Nitride Atomic Layer Deposition: A Brief Review of Precursor Chemistry

atomic layer deposition (ALD), microelectronics, Mo:Al2O3 films, nanocomposite coating, photovoltaics, semiconductor devices, W:Al2O3 films, composite films, layer-by-layer

Synthesis of Melting Gels Using Mono-Substituted and Di-Substituted Alkoxysiloxanes

Synthesis of Melting Gels Using Mono-Substituted and Di-Substituted Alkoxysiloxanes

Our team of scientists has experience in all areas of research including Life Science, Material Science, Chemical Synthesis, Chromatography, Analytical and many others.

Contact Technical Service